⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid SCHEMBL28563115 | 0.79 | THRB (0.30) | — | |
| Methacrylic Acid SCHEMBL28235913 | 0.70 | HSD11B1 (0.33) | — | |
| Acrylic Acid SCHEMBL5147956 | 0.69 | CYP2C9 (0.41) | — | |
| Acrylic Acid SCHEMBL28572013 | 0.68 | ALDH1A1 (0.43) | — | |
| Acrylic Acid SCHEMBL28235914 | 0.67 | THRB (0.38) | — | |
| SCHEMBL28790459 | 0.67 | — | — | |
| Acrylic Acid SCHEMBL5147959 | 0.65 | THRB (0.39) | — | |
| Acrylic Acid SCHEMBL30730748 | 0.65 | THRB (0.39) | — | |
| SCHEMBL451377 | 0.65 | ALDH1A1 (0.31) | — | |
| Acrylic Acid SCHEMBL17200235 | 0.64 | THRB (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112876602-A | Low-defect 193nm photoresist, photoresist resin and preparation method thereof | 宁波南大光电材料有限公司 | 2021-06-01 | — | — | CN | disclosed |