SCHEMBL28569489

SCHEMBL28569489

C=CC(=O)C[Si](C)(OC)OC

nearest known ligand 0.42

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.42
TSHR P16473 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14843014 0.80 TSHR (0.41) ALDH1A1TSHR
SCHEMBL4757613 0.79 TSHR (0.44) ALDH1A1TSHR
SCHEMBL7952686 0.75
SCHEMBL1305038 0.75 ALDH1A1 (0.37) ALDH1A1TSHR
SCHEMBL29057825 0.74 ALDH1A1 (0.35) ALDH1A1TSHR
SCHEMBL30540367 0.71 ALDH1A1 (0.33) ALDH1A1TSHR
SCHEMBL29424096 0.71 TSHR (0.38) ALDH1A1TSHR
SCHEMBL9419775 0.70 FFAR3 (0.33) ALDH1A1TSHR
SCHEMBL108692 0.70 TSHR (0.45) ALDH1A1TSHR
SCHEMBL3919522 0.69 TSHR (0.46) ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112731764-A Negative photoresist composition and method for forming photoresist pattern 苏州理硕科技有限公司 2021-04-30 CN disclosed