SCHEMBL2858386

SCHEMBL2858386

CC(C)=C(C)C(=O)OCCC(O)CO

nearest known ligand 0.36

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.34
PLA2G2C Q5R387 1/20 0.34
KDM4E B2RXH2 1/20 0.32
DUSP3 P51452 1/20 0.32
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
LMNA P02545 1/20 0.32
CHRNB2 P17787 1/20 0.32
CHRNA4 P43681 1/20 0.32
CHRM5 P08912 1/20 0.31
CHRM1 P11229 1/20 0.31
CHRM3 P20309 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2169339 0.83 CHRM5 (0.34) MEN1KMT2ACHRNB2CHRNA4CHRM5
SCHEMBL36359 0.81 THRB (0.48) THRBPLA2G2CKDM4EDUSP3MEN1
SCHEMBL25708 0.80 LMNA (0.44) KDM4EDUSP3MEN1KMT2ALMNA
SCHEMBL7700789 0.79 ALOX15 (0.44) THRBPLA2G2CKDM4EDUSP3MEN1
SCHEMBL5988620 0.79 ALOX15 (0.44) THRBPLA2G2CKDM4EDUSP3MEN1
SCHEMBL633281 0.78 USP2 (0.49) PLA2G2CKDM4EDUSP3MEN1KMT2A
SCHEMBL2830658 0.78 KDM4E (0.51) KDM4EDUSP3MEN1KMT2ALMNA
SCHEMBL165955 0.76 TSHR (0.34) LMNACHRM5CHRM1CHRM3
SCHEMBL6858411 0.76 CHRNB2 (0.34) THRBCHRNB2CHRNA4CHRM5CHRM1
SCHEMBL14672303 0.74 THRB (0.43) THRBPLA2G2CKDM4EDUSP3MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180187041-A1 METALLIZABLE, SCRATCH-RESISTANT AND SOLVENT-RESISTANT FILM COVESTRO DEUTSCHLAND AG (DE) 2018-07-05 US disclosed
US-10000658-B2 Metallizable, scratch-resistant and solvent-resistant film COVESTRO DEUTSCHLAND AG (DE) 2018-06-19 US disclosed
US-20180118971-A1 AQUEOUS POLYURETHANE-POLYACRYLATE DISPERSIONS COVESTRO DEUTSCHLAND AG (DE) 2018-05-03 US disclosed
US-20160311991-A1 LOW-OILING COATED POLYCARBONATE FILMS COVESTRO DEUTSCHLAND AG (DE) 2016-10-27 US disclosed
US-20160152833-A1 DIRECTION-INDEPENDENTLY IMPACT-RESISTANT 3-D MOLDED PARTS COVESTRO DEUTSCHLAND AG (DE) 2016-06-02 US disclosed
US-20160152863-A1 METALLIZABLE, SCRATCH-RESISTANT AND SOLVENT-RESISTANT FILM Covestro Deustschland AG (DE) 2016-06-02 US disclosed
US-20160137873-A1 GLARE-FREE, MICROSTRUCTURED, AND SPECIALLY COATED FILM COVESTRO DEUTSCHLAND AG (DE) 2016-05-19 US disclosed
US-20160115322-A1 RADIATION-CURABLE COATING COMPOSITION COVESTRO DEUTSCHLAND AG (DE) 2016-04-28 US disclosed
US-20160115335-A1 LOW-OILING, SCRATCH-RESISTANT, AND SOLVENT-RESISTANT POLYCARBONATE FILM COVESTRO DEUTSCHLAND AG (DE) 2016-04-28 US disclosed
WO-2010144348-A2 REDUCTION OF ANTIBIOTIC ACTIVITY OR CONCENTRATION IN BIOLOGICAL SAMPLES USING MOLECULARLY IMPRINTED POLYMERS BECTON, DICKINSON AND COMPANY (US) 2010-12-16 WO disclosed
EP-0719425-A1 PHOTOSENSITIVE COMPOSITIONS AND ELEMENTS FOR FLEXOGRAPHIC PRINTING CHASE ELASTOMER CORPORATION (US) 1996-07-03 EP disclosed
US-5496685-A MANUFACTURING A PRINTING PLATE CHASE ELASTOMER CORPORATION (US) 1996-03-05 US disclosed
US-5496684-A IMAGE WISE EXPOSURE TO ACTINIC RADIATION FOR LIGHT SENSITIVE ELEMENT SUPPORTS, REMOVAL OF LAYER WITH SOLVENT FOR PLATES AND DEVELOPMENT OF CROSSLINKING AGENT CHASE ELASTOMER CORPORATION (US) 1996-03-05 US disclosed
WO-1995008137-A1 PHOTOSENSITIVE COMPOSITIONS AND ELEMENTS FOR FLEXOGRAPHIC PRINTING CHASE ELASTOMER CORPORATION (US) 1995-03-23 WO disclosed
WO-1995008136-A1 PHOTOSENSITIVE COMPOSITIONS AND ELEMENTS FOR FLEXOGRAPHIC PRINTING CHASE ELASTOMER CORPORATION (US) 1995-03-23 WO disclosed
EP-0104751-B1 PHOTOSENSITIVE ELASTOMERIC POLYMER COMPOSITION FOR FLEXOGRAPHIC PRINTING PLATES W.R. Grace & Co.-Conn. (US) 1992-10-28 EP disclosed
EP-0373852-A2 Compounds SMITH KLINE & FRENCH LABORATORIES LIMITED (GB) 1990-06-20 EP disclosed
US-4689290-A CARBOXYLATED ACRYLONITRILE-BUTADIENE COPOLYMER; MULTILAYER UNIROYAL PLASTICS CO., INC. (US) 1987-08-25 US disclosed
US-4686172-A Photosensitive elastomeric composition for flexographic printing plates having improved softness UNIROYAL PLASTICS CO., INC. (US) 1987-08-11 US disclosed
US-3942996-A Radiation sensitive recording material AGFA-GEVAERT AKTIENGESELLSCHAFT (DT) 1976-03-09 US disclosed