SCHEMBL28601450

SCHEMBL28601450

O=C(O)c1ccc(-c2c3ccccc3nc3ccccc23)cc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ATM Q13315 1/20 0.57
ESR1 P03372 2/20 0.51
ESR2 Q92731 2/20 0.51
LMNA P02545 1/20 0.51
KMT2A Q03164 2/20 0.51
KDM4E B2RXH2 1/20 0.51
ALDH1A1 P00352 1/20 0.51
HPGD P15428 1/20 0.51
GAA P10253 1/20 0.51
MAPT P10636 1/20 0.51
NPSR1 Q6W5P4 1/20 0.51
ABCG2 Q9UNQ0 2/20 0.51
ABCC1 P33527 1/20 0.51
MAP2K4 P45985 1/20 0.50
TTR P02766 1/20 0.50
MEN1 O00255 1/20 0.50
SIRT5 Q9NXA8 1/20 0.50
MAPK1 P28482 1/20 0.48
NPC1 O15118 1/20 0.47
RAB9A P51151 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15292882 0.86 ESR1 (0.58) ATMESR1ESR2LMNAKMT2A
SCHEMBL6350818 0.86 TTR (0.59) HPGDNPSR1MAP2K4TTRNPC1
SCHEMBL29388499 0.86 TTR (0.59) HPGDNPSR1MAP2K4TTRNPC1
SCHEMBL29488288 0.86 MAPT (0.58) ESR1ESR2LMNAKMT2AKDM4E
SCHEMBL3343178 0.86 MAPT (0.58) ESR1ESR2LMNAKMT2AKDM4E
SCHEMBL24417955 0.84 ATM (0.49) ATMLMNAKMT2AKDM4EALDH1A1
SCHEMBL29274262 0.82 TNKS (0.63) LMNAKMT2AKDM4EALDH1A1HPGD
SCHEMBL21164720 0.81 KDM4E (0.55) KMT2AKDM4EALDH1A1HPGDMAP2K4
SCHEMBL21164721 0.80 KDM4E (0.53) KMT2AKDM4EALDH1A1HPGDMAP2K4
SCHEMBL24222067 0.80 TTR (0.49) ESR1ESR2KMT2AKDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108241259-B Resist composition with good hole masking function and capable of directly depicting, exposing and imaging 杭州福斯特电子材料有限公司 2021-08-10 CN claimed
CN-113156764-B Photosensitive resin composition and resist laminate 杭州福斯特电子材料有限公司 2024-04-26 CN disclosed
CN-115047714-A Resist composition and laminate thereof 杭州福斯特电子材料有限公司 2022-09-13 CN disclosed
CN-108241259-B Resist composition with good hole masking function and capable of directly depicting, exposing and imaging 杭州福斯特电子材料有限公司 2021-08-10 CN disclosed
CN-113156764-A Photosensitive resin composition and resist laminate 浙江福斯特新材料研究院有限公司 2021-07-23 CN disclosed