Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 5/20 | 0.58 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.58 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.53 |
| ▸ | GAA | P10253 | 1/20 | 0.53 |
| ▸ | NPC1 | O15118 | 2/20 | 0.50 |
| ▸ | GUSB | P08236 | 1/20 | 0.50 |
| ▸ | ESR1 | P03372 | 2/20 | 0.49 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.49 |
| ▸ | RAB9A | P51151 | 2/20 | 0.48 |
| ▸ | AHR | P35869 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.47 |
| ▸ | HTT | P42858 | 1/20 | 0.47 |
| ▸ | HPGD | P15428 | 3/20 | 0.46 |
| ▸ | TP53 | P04637 | 2/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.46 |
| ▸ | MEN1 | O00255 | 1/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.46 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.46 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3343178 | 1.00 | MAPT (0.58) | MAPTSMN1; SMN2NPSR1GAANPC1 | |
| SCHEMBL28601450 | 0.86 | ATM (0.57) | MAPTSMN1; SMN2NPSR1GAANPC1 | |
| SCHEMBL20783478 | 0.85 | MAPT (0.73) | MAPTSMN1; SMN2NPC1RAB9AALDH1A1 | |
| SCHEMBL20783543 | 0.84 | MAPT (0.77) | MAPTSMN1; SMN2NPC1RAB9AALDH1A1 | |
| SCHEMBL29274262 | 0.82 | TNKS (0.63) | MAPTSMN1; SMN2GAANPC1RAB9A | |
| SCHEMBL29488277 | 0.82 | MAP4K4 (0.57) | MAPTSMN1; SMN2NPSR1GAANPC1 | |
| SCHEMBL3344987 | 0.82 | MAP4K4 (0.57) | MAPTSMN1; SMN2NPSR1GAANPC1 | |
| SCHEMBL29141505 | 0.80 | MAPT (0.55) | MAPTSMN1; SMN2GAANPC1GUSB | |
| SCHEMBL38651690 | 0.80 | MAPT (0.63) | MAPTSMN1; SMN2NPC1RAB9AALDH1A1 | |
| SCHEMBL9638586 | 0.79 | ELANE (0.51) | MAPTSMN1; SMN2NPSR1GAANPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110357989-B | Tertiary amine photosensitizer, preparation method thereof, photosensitive resin composition containing tertiary amine photosensitizer and application of photosensitive resin composition | 常州强力电子新材料股份有限公司 | 2022-04-22 | — | — | CN | claimed |
| CN-120044756-A | Photosensitive resin composition | 旭化成株式会社 | 2025-05-27 | — | — | CN | disclosed |
| CN-115524922-B | Photosensitive resin composition | 旭化成株式会社 | 2025-02-18 | — | — | CN | disclosed |
| CN-119148465-A | Photosensitive resin composition, photosensitive dry film and application thereof | 杭州福斯特电子材料有限公司 | 2024-12-17 | — | — | CN | disclosed |
| CN-116981999-A | Photosensitive resin laminate and method for producing same | 旭化成株式会社 | 2023-10-31 | — | — | CN | disclosed |
| CN-111315828-B | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2023-09-29 | — | — | CN | disclosed |
| CN-111694218-B | Photosensitive resin composition and method for forming circuit pattern | 旭化成株式会社 | 2023-09-08 | — | — | CN | disclosed |
| CN-112154167-B | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2023-08-22 | — | — | CN | disclosed |
| CN-111527450-B | Photosensitive resin laminate and method for producing same | 旭化成株式会社 | 2023-08-08 | — | — | CN | disclosed |
| CN-111596526-B | Photosensitive resin composition and photosensitive resin laminate | 旭化成株式会社 | 2023-07-25 | — | — | CN | disclosed |
| CN-116348294-A | Photosensitive resin laminate | 旭化成株式会社 | 2023-06-27 | — | — | CN | disclosed |
| CN-115524922-A | Photosensitive resin composition | 旭化成株式会社 | 2022-12-27 | — | — | CN | disclosed |
| CN-110325913-B | Photosensitive resin composition | 旭化成株式会社 | 2022-11-01 | — | — | CN | disclosed |
| CN-114667487-A | Photosensitive resin composition and photosensitive resin laminate | 旭化成株式会社 | 2022-06-24 | — | — | CN | disclosed |
| CN-110114376-B | Curable composition, method for producing cured product, cured product thereof, and adhesive using same | 株式会社ADEKA | 2022-06-14 | — | — | CN | disclosed |
| WO-2022085366-A1 | PHOTOSENSITIVE RESIN MULTILAYER BODY | 旭化成株式会社 | 2022-04-28 | — | — | WO | disclosed |
| CN-110357989-B | Tertiary amine photosensitizer, preparation method thereof, photosensitive resin composition containing tertiary amine photosensitizer and application of photosensitive resin composition | 常州强力电子新材料股份有限公司 | 2022-04-22 | — | — | CN | disclosed |
| CN-114296315-A | Photosensitive resin composition | 旭化成株式会社 | 2022-04-08 | — | — | CN | disclosed |