Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 5/20 | 0.58 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.58 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.53 |
| ▸ | GAA | P10253 | 1/20 | 0.53 |
| ▸ | NPC1 | O15118 | 2/20 | 0.50 |
| ▸ | GUSB | P08236 | 1/20 | 0.50 |
| ▸ | ESR1 | P03372 | 2/20 | 0.49 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.49 |
| ▸ | RAB9A | P51151 | 2/20 | 0.48 |
| ▸ | AHR | P35869 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.47 |
| ▸ | HTT | P42858 | 1/20 | 0.47 |
| ▸ | HPGD | P15428 | 3/20 | 0.46 |
| ▸ | TP53 | P04637 | 2/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.46 |
| ▸ | MEN1 | O00255 | 1/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.46 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.46 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29488288 | 1.00 | MAPT (0.58) | MAPTSMN1; SMN2NPSR1GAANPC1 | |
| SCHEMBL28601450 | 0.86 | ATM (0.57) | MAPTSMN1; SMN2NPSR1GAANPC1 | |
| SCHEMBL20783478 | 0.85 | MAPT (0.73) | MAPTSMN1; SMN2NPC1RAB9AALDH1A1 | |
| SCHEMBL20783543 | 0.84 | MAPT (0.77) | MAPTSMN1; SMN2NPC1RAB9AALDH1A1 | |
| SCHEMBL29274262 | 0.82 | TNKS (0.63) | MAPTSMN1; SMN2GAANPC1RAB9A | |
| SCHEMBL29488277 | 0.82 | MAP4K4 (0.57) | MAPTSMN1; SMN2NPSR1GAANPC1 | |
| SCHEMBL3344987 | 0.82 | MAP4K4 (0.57) | MAPTSMN1; SMN2NPSR1GAANPC1 | |
| SCHEMBL29141505 | 0.80 | MAPT (0.55) | MAPTSMN1; SMN2GAANPC1GUSB | |
| SCHEMBL38651690 | 0.80 | MAPT (0.63) | MAPTSMN1; SMN2NPC1RAB9AALDH1A1 | |
| SCHEMBL9638586 | 0.79 | ELANE (0.51) | MAPTSMN1; SMN2NPSR1GAANPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 61 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | claimed |
| US-4587200-A | Photopolymerizable composition comprising an acridine and a heterocyclic thiol compound as a photopolymerization initiator and a photographic process using said photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1986-05-06 | — | — | US | claimed |
| US-12353130-B2 | Photosensitive resin composition and photosensitive resin multilayer body | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2025-07-08 | — | — | US | disclosed |
| WO-2025018412-A1 | PHOTOSENSITIVE ELEMENT, PHOTOSENSITIVE ELEMENT ROLL, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING CONDUCTOR PATTERN | 旭化成株式会社 | 2025-01-23 | — | — | WO | disclosed |
| US-20240408595-A1 | STRUCTURE COMPRISING MICROCHANNEL, PRODUCTION METHOD FOR SAID STRUCTURE, AND MICROCHANNEL DEVICE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-12-12 | — | — | US | disclosed |
| US-12032286-B2 | Method for producing multi-layered type microchannel device using photosensitive resin laminate | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-07-09 | — | — | US | disclosed |
| US-20240059803-A1 | PHOTOSENSITIVE RESIN MULTILAYER BODY AND METHOD FOR PRODUCING SAME | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-02-22 | — | — | US | disclosed |
| US-20230375930-A1 | PHOTOSENSITIVE RESIN MULTILAYER BODY | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2023-11-23 | — | — | US | disclosed |
| CN-116981999-A | Photosensitive resin laminate and method for producing same | 旭化成株式会社 | 2023-10-31 | — | — | CN | disclosed |
| CN-111694218-B | Photosensitive resin composition and method for forming circuit pattern | 旭化成株式会社 | 2023-09-08 | — | — | CN | disclosed |
| CN-111527450-B | Photosensitive resin laminate and method for producing same | 旭化成株式会社 | 2023-08-08 | — | — | CN | disclosed |
| CN-101779165-A | Photosensitive resin composition and laminate thereof | ASAHI KASEI EMD CORP | 2010-07-14 | — | — | CN | disclosed |
| US-20100159691-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND LAMINATE | ASAHI KASEI EMD CORPORATION (JP) | 2010-06-24 | — | — | US | disclosed |
| CN-1945429-B | Photosensitive resin composition and photosensitive resin laminate using the same | ASAHI KASEI DENSHI K K | 2010-06-09 | — | — | CN | disclosed |
| CN-101568882-A | Photosensitive resin composition and laminate | ASAHI KASEI EMD CORP (JP) | 2009-10-28 | — | — | CN | disclosed |
| CN-101449208-A | Photosensitive resin composition and laminate | ASAHI KASEI EMD CORP (JP) | 2009-06-03 | — | — | CN | disclosed |
| CN-101438208-A | Photosensitive resin composition | ASAHI KASEI EMD CORP (JP) | 2009-05-20 | — | — | CN | disclosed |
| CN-1945429-A | Photosensitive resin composition and photosensitive resin laminate using the same | ASAHI KASEI DENSHI K K (JP) | 2007-04-11 | — | — | CN | disclosed |
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | disclosed |
| US-4587200-A | Photopolymerizable composition comprising an acridine and a heterocyclic thiol compound as a photopolymerization initiator and a photographic process using said photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1986-05-06 | — | — | US | disclosed |