SCHEMBL28636115

SCHEMBL28636115

CCC(CC)CC(CC)Cc1ccccc1O

nearest known ligand 0.57

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
HSPA5 P11021 1/20 0.45
MAPT P10636 1/20 0.43
TSHR P16473 3/20 0.42
CYP2D6 P10635 4/20 0.41
HIF1A Q16665 1/20 0.41
HTR1A P08908 1/20 0.41
TAAR1 Q96RJ0 1/20 0.39
AKR1B1 P15121 1/20 0.39
POLB P06746 1/20 0.39
MAPK1 P28482 1/20 0.39
IDO1 P14902 2/20 0.38
CA12 O43570 1/20 0.38
CA2 P00918 1/20 0.38
CYP3A4 P08684 3/20 0.38
SLC6A2 P23975 3/20 0.38
SLC6A4 P31645 3/20 0.38
SLC6A3 Q01959 3/20 0.38
KCNH2 Q12809 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2928610 0.85 TSHR (0.44) HSPA5TSHRCYP2D6HIF1AHTR1A
SCHEMBL1310747 0.84 TSHR (0.41) HSPA5MAPTTSHRCYP2D6HIF1A
SCHEMBL14586738 0.83 HSPA5 (0.43) HSPA5TSHRCYP2D6HIF1AHTR1A
SCHEMBL1311363 0.82 LMNA (0.44) HSPA5TSHRCYP2D6HIF1AHTR1A
SCHEMBL6993443 0.81 HTR1A (0.46) HSPA5MAPTTSHRCYP2D6HIF1A
SCHEMBL30763513 0.80 LMNA (0.51) HSPA5TSHRCYP2D6HIF1AHTR1A
SCHEMBL105941 0.80 LMNA (0.51) HSPA5TSHRCYP2D6HIF1AHTR1A
SCHEMBL11803191 0.80 LMNA (0.45) TSHRCA2CYP3A4
SCHEMBL2928397 0.80 PRSS1 (0.41) MAPTTSHRHTR1A
SCHEMBL28619583 0.79 TSHR (0.42) HSPA5TSHRCYP2D6HIF1AHTR1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120118458-A Curable composition, resin, and cured product 东京应化工业株式会社 2025-06-10 CN disclosed
CN-119937242-A Photosensitive resin composition 东京应化工业株式会社 2025-05-06 CN disclosed
CN-113337170-B Curable composition, cured product, near infrared absorbing filter, and method for producing same 东京应化工业株式会社 2024-04-05 CN disclosed
CN-117327362-A Curable resin composition 东京应化工业株式会社 2024-01-02 CN disclosed
CN-117215149-A Photosensitive resin composition 东京应化工业株式会社 2023-12-12 CN disclosed
CN-113337170-A Curable composition, cured product, near-infrared absorption filter, and method for producing same 东京应化工业株式会社 2021-09-03 CN disclosed