Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 3/20 | 0.50 |
| ▸ | NR5A1 | Q13285 | 1/20 | 0.50 |
| ▸ | MEN1 | O00255 | 1/20 | 0.48 |
| ▸ | NPC1 | O15118 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.48 |
| ▸ | GAA | P10253 | 1/20 | 0.48 |
| ▸ | MAPT | P10636 | 1/20 | 0.48 |
| ▸ | RAB9A | P51151 | 1/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.48 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.48 |
| ▸ | CNR2 | P34972 | 5/20 | 0.46 |
| ▸ | ADRB2 | P07550 | 2/20 | 0.45 |
| ▸ | GPR84 | Q9NQS5 | 1/20 | 0.42 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28636082 | 0.93 | LTA4H (0.50) | LTA4HNR5A1MEN1NPC1ALDH1A1 | |
| SCHEMBL28632798 | 0.86 | LTA4H (0.47) | LTA4HMEN1NPC1ALDH1A1MAPT | |
| SCHEMBL25329497 | 0.84 | ESR1 (0.53) | LTA4HNR5A1MEN1NPC1ALDH1A1 | |
| SCHEMBL20817198 | 0.83 | LTA4H (0.49) | LTA4HNR5A1MEN1NPC1ALDH1A1 | |
| SCHEMBL28632749 | 0.83 | LTA4H (0.49) | LTA4HNR5A1MEN1NPC1ALDH1A1 | |
| SCHEMBL1053968 | 0.82 | ADRB2 (0.62) | LTA4HNR5A1MEN1NPC1ALDH1A1 | |
| SCHEMBL21248098 | 0.80 | ALDH1A1 (0.50) | MEN1NPC1ALDH1A1GAAMAPT | |
| SCHEMBL224134 | 0.80 | CNR2 (0.59) | NR5A1MEN1MAPTKMT2ACNR2 | |
| SCHEMBL11606405 | 0.80 | NR5A1 (0.59) | LTA4HNR5A1CNR2 | |
| SCHEMBL11799012 | 0.80 | CNR2 (0.59) | NR5A1MEN1MAPTKMT2ACNR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113820920-B | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2023-07-04 | — | — | CN | disclosed |
| CN-110088680-B | Double-layer photosensitive layer roll | 旭化成株式会社 | 2022-12-30 | — | — | CN | disclosed |
| CN-115185157-A | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2022-10-14 | — | — | CN | disclosed |
| CN-109153841-B | Resin composition | 东丽株式会社 | 2021-12-31 | — | — | CN | disclosed |
| CN-113820920-A | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2021-12-21 | — | — | CN | disclosed |
| CN-107850844-B | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2021-09-07 | — | — | CN | disclosed |