SCHEMBL28648656

SCHEMBL28648656

COC(=O)C1(O)C=Cc2ccccc2C1

nearest known ligand 0.36

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
P2RX4 Q99571 1/20 0.35
MAPT P10636 3/20 0.34
TRPA1 O75762 5/20 0.33
IDO1 P14902 1/20 0.33
HTT P42858 2/20 0.33
NOTUM Q6P988 1/20 0.33
ALDH1A1 P00352 2/20 0.32
GAA P10253 2/20 0.32
KDM4E B2RXH2 1/20 0.32
LMNA P02545 1/20 0.32
POLB P06746 1/20 0.32
HPGD P15428 1/20 0.32
HSD17B10 Q99714 1/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
CYP3A4 P08684 1/20 0.32
TSHR P16473 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10393568 0.84 BRD4 (0.45) MEN1KMT2AMAPTHTTALDH1A1
SCHEMBL8846792 0.81 MAPT (0.33) P2RX4MAPTTRPA1GAALMNA
SCHEMBL7529245 0.80 CA1 (0.35) CA1CA2
SCHEMBL11626153 0.78 MAOB (0.36) CA1CA2
SCHEMBL10708088 0.72 NAMPT (0.48) HTTALDH1A1
SCHEMBL9649135 0.72 ALDH1A1 (0.40) MEN1KMT2AP2RX4MAPTHTT
SCHEMBL23781284 0.71 PARP1 (0.34) KMT2AALDH1A1CA1CA2
SCHEMBL30320240 0.71 MEN1 (0.43) MEN1KMT2AMAPTHTTNOTUM
SCHEMBL258234 0.70 PARP1 (0.36) MAPTGAACA1CA2
SCHEMBL31520302 0.70 PARP1 (0.36) MAPTGAACA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109960111-B Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and method for forming pattern 信越化学工业株式会社 2022-07-12 CN disclosed
CN-109283789-B Composition for forming organic film, method for forming pattern, and resin for forming organic film 信越化学工业株式会社 2021-11-05 CN disclosed