Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.34 |
| ▸ | GAA | P10253 | 3/20 | 0.34 |
| ▸ | MEN1 | O00255 | 2/20 | 0.34 |
| ▸ | ESR1 | P03372 | 2/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.34 |
| ▸ | CXCR2 | P25025 | 2/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.33 |
| ▸ | ATIC | P31939 | 1/20 | 0.33 |
| ▸ | CXCR1 | P25024 | 1/20 | 0.32 |
| ▸ | MCL1 | Q07820 | 2/20 | 0.32 |
| ▸ | HTT | P42858 | 2/20 | 0.32 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.32 |
| ▸ | ERN1 | O75460 | 1/20 | 0.32 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7582375 | 0.88 | GAA (0.34) | KDM4EGAAMEN1ESR1KMT2A | |
| SCHEMBL7584823 | 0.81 | KDM4E (0.38) | KDM4EGAAMEN1ESR1KMT2A | |
| SCHEMBL7584619 | 0.78 | GAA (0.36) | KDM4EGAAHSD17B10HPGDHTT | |
| SCHEMBL7574543 | 0.75 | MMP2 (0.35) | KDM4EGAAMEN1KMT2AHSD17B10 | |
| SCHEMBL7575551 | 0.75 | MEN1 (0.52) | GAAMEN1ESR1KMT2AESR2 | |
| SCHEMBL17847647 | 0.72 | KDM4E (0.48) | KDM4EMEN1KMT2AHSD17B10CYP2C9 | |
| SCHEMBL15093426 | 0.72 | CXCR2 (0.34) | CXCR2HSD17B10CXCR1HTTMAPT | |
| SCHEMBL17287531 | 0.72 | ADORA2A (0.36) | KDM4ECXCR2HSD17B10CYP2C9CXCR1 | |
| SCHEMBL19617217 | 0.71 | TUBB4A (0.43) | KDM4EKMT2AHPGDERN1TP53 | |
| SCHEMBL31459764 | 0.71 | TUBB4A (0.43) | KDM4EKMT2AHPGDERN1TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7829259-B2 | Resin for photoresist composition, photoresist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-11-09 | — | — | US | disclosed |
| US-7592123-B2 | Resin for photoresist composition, photoresist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-09-22 | — | — | US | disclosed |
| US-20090142700-A1 | RESIN FOR PHOTORESIST COMPOSITION, PHOTORESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-06-04 | — | — | US | disclosed |
| US-20070065748-A1 | Resin for photoresist composition, photoresist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-03-22 | — | — | US | disclosed |
| US-6800423-B2 | NEGATIVE RADIATION-SENSITIVE COMPOSITION, WHICH IS SUITABLE FOR EXPOSURE OF A FAR ULTRAVIOLET LIGHT COMPRISING A WAVELENGTH 193 NM OF ARF EXCIMER-LASER, FREED FROM CAUSES OF RESOLUTION DETERIORATION SUCH AS SWELLING DUE TO PERMEATION OF | RENESAS TECHNOLOGY CORP. (JP) | 2004-10-05 | — | — | US | disclosed |
| US-20030134232-A1 | Radiation-sensitive composition and method for forming patterns and fabricating semiconductor devices | RENESAS ELECTRONICS CORPORATION (JP) | 2003-07-17 | — | — | US | disclosed |
| US-20020196896-A1 | Exposure method, exposure apparatus, X-ray mask, semiconductor device and microstructure | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2002-12-26 | — | — | US | disclosed |
| EP-1193553-A2 | Exposure method, exposure apparatus, x-ray mask, semiconductor device and microstructure | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2002-04-03 | — | — | EP | disclosed |