SCHEMBL7574543

SCHEMBL7574543

CCCS(=O)(=O)Oc1c(C)c(C)c(O)c2ccccc12

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP2 P08253 2/20 0.35
MMP9 P14780 2/20 0.35
MMP14 P50281 2/20 0.35
MMP7 P09237 1/20 0.35
ALDH1A1 P00352 3/20 0.34
LMNA P02545 1/20 0.34
GAA P10253 4/20 0.34
HPGD P15428 2/20 0.34
KDM4E B2RXH2 3/20 0.33
MEN1 O00255 1/20 0.33
MAPT P10636 1/20 0.33
KMT2A Q03164 1/20 0.33
HSD17B10 Q99714 1/20 0.33
PAX3 P23760 1/20 0.32
FOXO1 Q12778 1/20 0.32
ALPL P05186 1/20 0.32
ALPI P09923 1/20 0.32
ENPP3 O14638 1/20 0.32
ENPP1 P22413 1/20 0.32
ENPP2 Q13822 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7584619 0.89 GAA (0.36) ALDH1A1LMNAGAAHPGDKDM4E
SCHEMBL7574548 0.88 MMP2 (0.35) MMP2MMP9MMP14MMP7ALDH1A1
SCHEMBL7584823 0.80 KDM4E (0.38) ALDH1A1LMNAGAAHPGDKDM4E
SCHEMBL7584624 0.77 ALPL (0.36) ALDH1A1GAAHPGDKDM4EMEN1
SCHEMBL7575551 0.77 MEN1 (0.52) ALDH1A1LMNAGAAMEN1MAPT
SCHEMBL2865145 0.75 KDM4E (0.34) LMNAGAAHPGDKDM4EMEN1
SCHEMBL16425183 0.71 ELANE (0.41) ALDH1A1LMNAGAAHPGDKDM4E
SCHEMBL9812637 0.70 KDM4E (0.56) ALDH1A1LMNAGAAKDM4EMAPT
SCHEMBL3244018 0.69 LMNA (0.54) ALDH1A1LMNAGAAKDM4EMEN1
SCHEMBL1088213 0.67 ALPL (0.40) MMP2MMP9MMP14MMP7GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020196896-A1 Exposure method, exposure apparatus, X-ray mask, semiconductor device and microstructure MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2002-12-26 US disclosed
EP-1193553-A2 Exposure method, exposure apparatus, x-ray mask, semiconductor device and microstructure MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2002-04-03 EP disclosed