Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 3/20 | 0.48 |
| ▸ | TP53 | P04637 | 1/20 | 0.48 |
| ▸ | CASP1 | P29466 | 2/20 | 0.41 |
| ▸ | RECQL | P46063 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.35 |
| ▸ | CA12 | O43570 | 1/20 | 0.34 |
| ▸ | CA1 | P00915 | 1/20 | 0.34 |
| ▸ | CA2 | P00918 | 1/20 | 0.34 |
| ▸ | CA7 | P43166 | 1/20 | 0.34 |
| ▸ | CA9 | Q16790 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.34 |
| ▸ | MAOB | P27338 | 4/20 | 0.34 |
| ▸ | MAOA | P21397 | 3/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 2/20 | 0.33 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19879408 | 0.78 | ACHE (0.42) | CYP3A4TP53ALDH1A1TDP1MAOB | |
| SCHEMBL9401853 | 0.78 | ALDH1A1 (0.48) | CYP3A4TP53CASP1RECQLALDH1A1 | |
| SCHEMBL2804398 | 0.75 | TDP1 (0.46) | CYP3A4TP53RECQLALDH1A1TSHR | |
| SCHEMBL28923184 | 0.75 | TAAR1 (0.49) | TSHRKDM4ESMN1; SMN2NOS1 | |
| SCHEMBL703521 | 0.74 | LTA4H (0.37) | TP53ALDH1A1TSHRMEN1KMT2A | |
| SCHEMBL1172590 | 0.74 | CYP3A4 (0.42) | CYP3A4TP53CASP1RECQLALDH1A1 | |
| SCHEMBL28386904 | 0.72 | ALDH1A1 (0.45) | CYP3A4TP53CASP1ALDH1A1TSHR | |
| Ethyne SCHEMBL28268842 | 0.71 | LTA4H (0.34) | TP53ALDH1A1TSHR | |
| SCHEMBL27988645 | 0.70 | CYP3A4 (0.60) | CYP3A4TP53CASP1RECQLALDH1A1 | |
| SCHEMBL19528658 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12109812-B2 | Ink jet printing method and ink jet printing apparatus | SEIKO EPSON CORPORATION (JP) | 2024-10-08 | — | — | US | disclosed |
| CN-114055975-B | Ink jet recording method and ink jet recording apparatus | 精工爱普生株式会社 | 2023-05-12 | — | — | CN | disclosed |
| CN-114055975-A | Ink jet recording method and ink jet recording apparatus | 精工爱普生株式会社 | 2022-02-18 | — | — | CN | disclosed |
| US-20220032618-A1 | Ink Jet Printing Method And Ink Jet Printing Apparatus | SEIKO EPSON CORPORATION (JP) | 2022-02-03 | — | — | US | disclosed |
| EP-3067395-B1 | ULTRAVIOLET RADIATION-CURABLE COMPOSITION, AND RECORDED MATTER | SEIKO EPSON CORP (JP) | 2020-10-28 | — | — | EP | disclosed |
| US-10392522-B2 | Ultraviolet curable composition and recorded object | SEIKO EPSON CORPORATION (JP) | 2019-08-27 | — | — | US | disclosed |
| US-10300708-B2 | Ink jet composition, housing, and ink jet method | SEIKO EPSON CORPORATION (JP) | 2019-05-28 | — | — | US | disclosed |
| US-10279603-B2 | Production method of recording material, and recording material | SEIKO EPSON CORPORATION (JP) | 2019-05-07 | — | — | US | disclosed |
| US-10259208-B2 | Three-dimensional shaped object manufacturing device, method for manufacturing three-dimensional shaped object, and three-dimensional shaped object | SEIKO EPSON CORPORATION (JP) | 2019-04-16 | — | — | US | disclosed |
| US-9956726-B2 | Apparatus for producing three-dimensional structure, method of producing three-dimensional structure, and three-dimensional structure | SEIKO EPSON CORPORATION (JP) | 2018-05-01 | — | — | US | disclosed |
| US-8322033-B2 | Method for forming a conductive post for a multilayered wiring substrate | SEIKO EPSON CORPORATION (JP) | 2012-12-04 | — | — | US | disclosed |
| US-7776397-B2 | Process for producing chemical adsorption film and chemical adsorption film | SEIKO EPSON CORPORATION (JP) | 2010-08-17 | — | — | US | disclosed |
| US-20090077798-A1 | METHOD FOR FORMING CONDUCTIVE POST, METHOD FOR MANUFACTURING MULTILAYERED WIRING SUBSTRATE, AND METHOD FOR MANUFACTURING ELECTRONIC APPARATUS | SEIKO EPSON CORPORATION (JP) | 2009-03-26 | — | — | US | disclosed |
| US-20090071706-A1 | METHOD FOR PRODUCING MULTILAYERED WIRING SUBSTRATE, MULTILAYERED WIRING SUBSTRATE, AND ELECTRONIC APPARATUS | SEIKO EPSON CORPORATION (JP) | 2009-03-19 | — | — | US | disclosed |
| US-7500895-B2 | Patterned substrate, electro-optical device, and method for manufacturing an electro-optical device | SEIKO EPSON CORPORATION (JP) | 2009-03-10 | — | — | US | disclosed |
| US-20080317943-A1 | METHOD FOR FORMING PATTERN, METHOD FOR MANUFACTURING ELECTRO-OPTICAL DEVICE, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | SEIKO EPSON CORPORATION (JP) | 2008-12-25 | — | — | US | disclosed |
| US-20080311285-A1 | CONTACT HOLE FORMING METHOD, CONDUCTING POST FORMING METHOD, WIRING PATTERN FORMING METHOD, MULTILAYERED WIRING SUBSTRATE PRODUCING METHOD, ELECTRO-OPTICAL DEVICE PRODUCING METHOD, AND ELECTRONIC APPARATUS PRODUCING METHOD | SEIKO EPSON CORPORATION (JP) | 2008-12-18 | — | — | US | disclosed |
| US-20060127563-A1 | Patterned substrate, electro-optical device, and method for manufacturing an electro-optical device | SEIKO EPSON CORPORATION (JP) | 2006-06-15 | — | — | US | disclosed |
| US-20060019034-A1 | Process for producing chemical adsorption film and chemical adsorption film | SEIKO EPSON CORPORATION (JP) | 2006-01-26 | — | — | US | disclosed |
| US-20050287392-A1 | Organic electroluminescent device, method for producing the same, and electronic apparatus | SEIKO EPSON CORPORATION (JP) | 2005-12-29 | — | — | US | disclosed |