SCHEMBL2865994

SCHEMBL2865994

O=CC(=O)c1cccc2c(Cl)cccc12

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 3/20 0.50
CYP2A6 P11509 3/20 0.50
KMT2A Q03164 4/20 0.47
ATM Q13315 1/20 0.47
TSHR P16473 1/20 0.42
CES2 O00748 1/20 0.42
CES1 P23141 1/20 0.42
ALDH1A1 P00352 5/20 0.41
NR4A2 P43354 1/20 0.41
MEN1 O00255 3/20 0.39
TDP1 Q9NUW8 2/20 0.39
POLB P06746 1/20 0.38
MAPK1 P28482 1/20 0.38
ESR1 P03372 1/20 0.37
ESR2 Q92731 1/20 0.37
KDM4E B2RXH2 2/20 0.37
MAPT P10636 1/20 0.37
PKM P14618 1/20 0.37
HPGD P15428 1/20 0.37
HTT P42858 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2652860 0.80 ALDH1A1 (0.50) KMT2ATSHRCES2CES1ALDH1A1
SCHEMBL8723935 0.80 TSHR (0.61) KMT2ATSHRCES2CES1ALDH1A1
SCHEMBL293634 0.79 CES2 (0.60) CYP1A2KMT2ATSHRCES2CES1
SCHEMBL29952517 0.79 CES2 (0.60) CYP1A2KMT2ATSHRCES2CES1
SCHEMBL13090245 0.78 ALDH1A1 (0.39) CYP1A2KMT2ACES2CES1ALDH1A1
SCHEMBL4098387 0.78 TSHR (0.63) CYP1A2CYP2A6KMT2AATMTSHR
Water SCHEMBL10353121 0.78 CES2 (0.58) CYP1A2KMT2ATSHRCES2CES1
SCHEMBL27559735 0.76 KDM4E (0.48) CYP1A2KMT2AALDH1A1NR4A2MEN1
SCHEMBL6915038 0.76 CYP1A2 (0.54) CYP1A2CYP2A6KMT2AATMTSHR
SCHEMBL4104938 0.76 CYP1A2 (0.54) CYP1A2CYP2A6KMT2AATMTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7754844-B2 Polyarylene ether compound containing sulfonic acid group, composition containing same, and method for manufacturing those TOYO BOSEKI KABUSHIKI KAISHA (JP) 2010-07-13 US disclosed
EP-1561768-B1 POLYARYLENE ETHER COMPOUND CONTAINING SULFONIC ACID GROUP, COMPOSITION CONTAINING SAME, AND METHOD FOR MANUFACTURING THOSE TOYO BOSEKI (JP) 2009-09-30 EP disclosed
US-20060166048-A1 Polyarylene ether compound containing sulfonic acid group, composition containing same, and method for manufacturing those TOYO BOSEKI KABUSHIKI KAISHA (JP) 2006-07-27 US disclosed
EP-1561768-A1 POLYARYLENE ETHER COMPOUND CONTAINING SULFONIC ACID GROUP, COMPOSITION CONTAINING SAME, AND METHOD FOR MANUFACTURING THOSE Toyo Boseki Kabushiki Kaisha (JP) 2005-08-10 EP disclosed