SCHEMBL28660896

SCHEMBL28660896

CCO[SiH](Nc1ccc(O)cc1)OCC

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 9/20 0.42
MAPT P10636 9/20 0.42
MEN1 O00255 6/20 0.42
KMT2A Q03164 6/20 0.42
GAA P10253 6/20 0.42
L3MBTL1 Q9Y468 6/20 0.42
BLM P54132 5/20 0.42
THRB P10828 5/20 0.42
RECQL P46063 3/20 0.42
TDP1 Q9NUW8 3/20 0.42
PLEC Q15149 2/20 0.42
ATM Q13315 1/20 0.42
ALOX15 P16050 6/20 0.39
HSD17B10 Q99714 5/20 0.39
CASP1 P29466 4/20 0.39
HPGD P15428 3/20 0.39
MAPK1 P28482 3/20 0.39
USP2 O75604 3/20 0.39
POLB P06746 2/20 0.39
ALOX12 P18054 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3891707 0.79 NPSR1 (0.42) ALDH1A1MAPTGAAL3MBTL1TDP1
SCHEMBL19809216 0.68 LTA4H (0.42) ALDH1A1MAPTMEN1KMT2ABLM
SCHEMBL11795587 0.68 ALDH1A1 (0.42) ALDH1A1MAPTMEN1KMT2AGAA
P-Cresol SCHEMBL11777549 0.67 ACHE (0.56) ALDH1A1MAPTMEN1KMT2AGAA
SCHEMBL12451087 0.65 MAPT (0.48) ALDH1A1MAPTMEN1KMT2AGAA
Hydroquinone SCHEMBL60032 0.65 LTA4H (0.52) ALDH1A1MAPTMEN1KMT2ABLM
Hydroquinone SCHEMBL925171 0.65 LTA4H (0.52) ALDH1A1MAPTMEN1KMT2ABLM
Hydroquinone SCHEMBL8536783 0.65 LTA4H (0.52) ALDH1A1MAPTMEN1KMT2ABLM
Hydroquinone SCHEMBL2212873 0.65 LTA4H (0.52) ALDH1A1MAPTMEN1KMT2ABLM
Hydroquinone SCHEMBL11136724 0.65 LTA4H (0.52) ALDH1A1MAPTMEN1KMT2ABLM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110099974-B Composition for forming protective layer on substrate 日产化学株式会社 2022-02-25 CN disclosed
CN-111423813-B Composition for forming release layer and release layer 日产化学工业株式会社 2021-11-23 CN disclosed