Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.38 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.38 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.38 |
| ▸ | NR4A3 | Q92570 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.38 |
| ▸ | HPGD | P15428 | 4/20 | 0.38 |
| ▸ | HMGB1 | P09429 | 2/20 | 0.38 |
| ▸ | NAPRT | Q6XQN6 | 2/20 | 0.38 |
| ▸ | CA12 | O43570 | 1/20 | 0.38 |
| ▸ | CA1 | P00915 | 1/20 | 0.38 |
| ▸ | CA2 | P00918 | 1/20 | 0.38 |
| ▸ | CA4 | P22748 | 1/20 | 0.38 |
| ▸ | CA6 | P23280 | 1/20 | 0.38 |
| ▸ | CA7 | P43166 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | CA9 | Q16790 | 1/20 | 0.38 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL36891321 | 1.00 | ALDH1A1 (0.43) | ALDH1A1ALOX15HSD17B10TSHRNR4A1 | |
| SCHEMBL6201130 | 0.87 | ALDH1A1 (0.39) | ALDH1A1ALOX15HSD17B10TSHRNR4A1 | |
| SCHEMBL13980589 | 0.83 | ALDH1A1 (0.42) | ALDH1A1ALOX15KDM4EHPGDCA1 | |
| SCHEMBL16116287 | 0.83 | PARP1 (0.46) | ALDH1A1HSD17B10TSHRKDM4EHPGD | |
| SCHEMBL29354955 | 0.83 | PARP1 (0.46) | ALDH1A1HSD17B10TSHRKDM4EHPGD | |
| SCHEMBL5753321 | 0.81 | ALDH1A1 (0.40) | ALDH1A1ALOX15HSD17B10TSHRNR4A1 | |
| Hydrochloric Acid SCHEMBL20510158 | 0.81 | PARP1 (0.45) | ALDH1A1HSD17B10TSHRKDM4EHPGD | |
| SCHEMBL9365693 | 0.80 | HSD17B10 (0.46) | ALDH1A1HSD17B10TSHRNR4A1NR4A2 | |
| SCHEMBL5749754 | 0.79 | ALDH1A1 (0.38) | ALDH1A1ALOX15HSD17B10TSHRNR4A1 | |
| SCHEMBL8765423 | 0.79 | TRPA1 (0.50) | ALDH1A1ALOX15HSD17B10TSHRKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2019200114-A1 | METHODS FOR PREPARING SUBSTITUTED DIHYDROINDENE-4-CARBOXAMIDE COMPOUNDS | ARBUTUS BIOPHARMA CORPORATION (CA) | 2019-10-17 | — | — | WO | claimed |
| CN-110267944-A | Compounds useful for treating gastrointestinal disorders | 阿德利克斯股份有限公司 | 2019-09-20 | — | — | CN | claimed |
| CN-105209429-B | SHIP1 conditioning agents and relative method | 阿奎诺克斯药物（加拿大）公司 | 2018-05-29 | — | — | CN | claimed |
| US-11774853-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| US-11415887-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-08-16 | — | — | US | disclosed |
| US-11187980-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-11-30 | — | — | US | disclosed |
| US-20210302838-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-09-30 | — | — | US | disclosed |
| US-20200272048-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-08-27 | — | — | US | disclosed |
| US-20200241414-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-30 | — | — | US | disclosed |
| US-20200192222-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-06-18 | — | — | US | disclosed |
| US-20200073237-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-03-05 | — | — | US | disclosed |
| CN-106459019-A | Azoline compounds | 巴斯夫欧洲公司 | 2017-02-22 | — | — | CN | disclosed |
| US-9360753-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-07 | — | — | US | disclosed |
| US-9164383-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-10-20 | — | — | US | disclosed |
| WO-2014170915-A1 | INSECT REPELLENTS | COUNCIL OF SCIENTIFIC AND INDUSTRIAL RESEARCH (IN) | 2014-10-23 | — | — | WO | disclosed |
| US-20130029270-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-31 | — | — | US | disclosed |
| US-20120202153-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-09 | — | — | US | disclosed |
| US-20120202153-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-09 | — | — | US | disclosed |
| EP-2427444-A1 | INHIBITORS OF THE RENAL OUTER MEDULLARY POTASSIUM CHANNEL | Merck Sharp & Dohme Corp. (US) | 2012-03-14 | — | — | EP | disclosed |
| WO-2010121646-A1 | HETEROCYCLIC COMPOUNDS AS MEK INHIBITORS | NOVARTIS AG (CH) | 2010-10-28 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200241414-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | INSR, HNRNPU, HNRNPR | ALDH1A1 4836/4885ALOX15 1714/4885HSD17B10 3986/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.