SCHEMBL28684977

SCHEMBL28684977

Cc1cccc(OC(=O)Oc2cccc3c2ccc2c4ccccc4ccc32)c1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 2/20 0.48
▸ KMT2A Q03164 8/20 0.44
▸ MEN1 O00255 5/20 0.44
▸ ESR1 P03372 2/20 0.44
▸ POLB P06746 1/20 0.44
▸ ESR2 Q92731 1/20 0.44
▸ ALDH1A1 P00352 6/20 0.43
▸ GAA P10253 3/20 0.43
▸ MAPK1 P28482 3/20 0.43
▸ PGR P06401 1/20 0.43
▸ PTGS1 P23219 1/20 0.43
▸ HSD17B10 Q99714 1/20 0.43
▸ CYP3A4 P08684 3/20 0.42
▸ CYP1A2 P05177 2/20 0.42
▸ CYP2C9 P11712 2/20 0.42
▸ CYP2C19 P33261 2/20 0.42
▸ MAPT P10636 4/20 0.41
▸ KDM4E B2RXH2 1/20 0.41
▸ CRHBP P24387 1/20 0.41
▸ CRHR2 Q13324 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28684574 0.86 ALDH1A1 (0.46) LMNAKMT2AMEN1ESR1ESR2
SCHEMBL28688861 0.86 ALDH1A1 (0.46) KMT2AMEN1ESR1POLBESR2
SCHEMBL1433070 0.85 LMNA (0.53) LMNAKMT2AMEN1ESR1POLB
SCHEMBL18817858 0.84 HSD17B10 (0.53) KMT2AMEN1ESR1POLBESR2
SCHEMBL28372155 0.84 LMNA (0.50) LMNAKMT2AMEN1ESR1POLB
SCHEMBL28683213 0.82 ALDH1A1 (0.49) LMNAKMT2AMEN1ESR1POLB
SCHEMBL8764848 0.82 HSD17B10 (0.51) LMNAKMT2AMEN1ALDH1A1GAA
SCHEMBL28683211 0.80 KMT2A (0.69) KMT2AMEN1ESR1POLBESR2
SCHEMBL28684572 0.79 HSD17B10 (0.55) LMNAKMT2AMEN1ALDH1A1GAA
SCHEMBL1034093 0.79 LMNA (0.57) LMNAKMT2AMEN1POLBALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109471330-B Photosensitive composition and photopolymerization initiator used therein 东京应化工业株式会社 2023-08-29 — — CN disclosed
CN-106970503-B Photosensitive composition 东京应化工业株式会社 2022-02-01 — — CN disclosed
Send feedback