SCHEMBL28372155

SCHEMBL28372155

Cc1cccc(OC(=O)Oc2cccc3cc4cc5ccccc5cc4cc23)c1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 1/20 0.50
▸ GAA P10253 4/20 0.44
▸ CYP3A4 P08684 2/20 0.44
▸ CYP1A2 P05177 1/20 0.44
▸ CYP2C9 P11712 1/20 0.44
▸ CYP2C19 P33261 1/20 0.44
▸ MAPT P10636 2/20 0.43
▸ KMT2A Q03164 5/20 0.41
▸ ALDH1A1 P00352 5/20 0.41
▸ MEN1 O00255 3/20 0.41
▸ BCHE P06276 1/20 0.41
▸ PPARG P37231 1/20 0.41
▸ SMN1; SMN2 Q16637 1/20 0.41
▸ MAPK1 P28482 3/20 0.41
▸ FAAH O00519 1/20 0.41
▸ POLB P06746 2/20 0.40
▸ KDM4E B2RXH2 2/20 0.40
▸ ESR1 P03372 2/20 0.40
▸ CRHBP P24387 1/20 0.40
▸ CRHR2 Q13324 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28371476 0.87 MAPT (0.45) LMNAGAACYP3A4CYP1A2CYP2C9
SCHEMBL28371867 0.87 ALDH1A1 (0.44) GAACYP1A2CYP2C19MAPTKMT2A
SCHEMBL28339440 0.87 ALDH1A1 (0.49) GAACYP1A2CYP2C19MAPTKMT2A
SCHEMBL29591103 0.85 ALDH1A1 (0.50) GAACYP1A2CYP2C19MAPTKMT2A
SCHEMBL19468524 0.85 ALDH1A1 (0.50) GAACYP1A2CYP2C19MAPTKMT2A
SCHEMBL28376052 0.84 ALDH1A1 (0.42) GAACYP1A2KMT2AALDH1A1MEN1
SCHEMBL28372649 0.84 KMT2A (0.47) GAAMAPTKMT2AALDH1A1MEN1
SCHEMBL28684977 0.84 LMNA (0.48) LMNAGAACYP3A4CYP1A2CYP2C9
SCHEMBL1433070 0.82 LMNA (0.53) LMNAGAACYP3A4CYP1A2CYP2C9
SCHEMBL28377393 0.82 ALDH1A1 (0.53) GAACYP1A2CYP2C19MAPTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112394617-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2021-02-23 — — CN disclosed
CN-111796482-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2020-10-20 — — CN disclosed
CN-110955114-A Photosensitive resin composition, method for producing patterned cured film, and cured film 东京应化工业株式会社 2020-04-03 — — CN disclosed
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