SCHEMBL28720

SCHEMBL28720

O=C1C=C(C2CCCCC2)C(=O)N1

nearest known ligand 0.44

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
MAOA P21397 2/20 0.44
MAOB P27338 2/20 0.44
PTPN1 P18031 2/20 0.41
PTPRC P08575 1/20 0.41
PTPRF P10586 1/20 0.41
CDC25B P30305 1/20 0.41
DAO P14920 2/20 0.37
EPHX2 P34913 1/20 0.34
MAPT P10636 2/20 0.32
HSP90AA1 P07900 1/20 0.32
GAA P10253 1/20 0.32
KMT2A Q03164 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
CEL P19835 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9250741 1.00 MAOA (0.44) MAOAMAOBPTPN1PTPRCPTPRF
SCHEMBL28123322 1.00 MAOA (0.44) MAOAMAOBPTPN1PTPRCPTPRF
SCHEMBL8885354 1.00 MAOA (0.44) MAOAMAOBPTPN1PTPRCPTPRF
Ammonia Solution, Strong SCHEMBL27877904 0.98 MAOA (0.42) MAOAMAOBPTPN1PTPRCPTPRF
SCHEMBL27630042 0.98 MAOA (0.45) MAOAMAOBPTPN1PTPRCPTPRF
SCHEMBL5202489 0.94 MAOA (0.41) MAOAMAOBPTPN1PTPRCPTPRF
Nitrous Acid SCHEMBL25432519 0.91 MAOA (0.38) MAOAMAOBPTPN1PTPRCPTPRF
Vinyl Chloride SCHEMBL379531 0.89 MAOA (0.37) MAOAMAOBPTPN1PTPRCPTPRF
SCHEMBL548282 0.89 MAOA (0.34) MAOAMAOBDAO
SCHEMBL8563214 0.89 MAOA (0.34) MAOAMAOBDAO

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 5920 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120044753-B Photosensitive dry film, photosensitive resin composition, cured film and printed circuit board Hangzhou foster Electronic Materials Co.,Ltd. (CN) 2026-05-26 CN claimed
CN-122037432-A Resin composition containing copolymer, method for producing same, and molded article 电化株式会社 2026-05-15 CN claimed
US-12624142-B2 Optical polymer material, optical film, display device, optical polymer material manufacturing method, and optical film manufacturing method Koike, Yasuhiro (JP) 2026-05-12 US claimed
US-12441876-B2 Curable resin composition and cured product thereof, and method for producing three-dimensional shaped product CANON KABUSHIKI KAISHA (JP) 2025-10-14 US claimed
US-20250215127-A1 RESIN COMPOSITION CONTAINING COPOLYMER, METHOD FOR PRODUCING SAME AND MOLDED BODY OF SAME DENKA COMPANY LIMITED (JP) 2025-07-03 US claimed
CN-120044753-A Photosensitive dry film, photosensitive resin composition, cured film and printed circuit board 杭州福斯特电子材料有限公司 2025-05-27 CN claimed
CN-114846372-B Optical polymer material, optical film, display device, method for producing optical polymer material, and method for producing optical film 小池康博 2025-01-24 CN claimed
EP-4477707-A1 RESIN COMPOSITION CONTAINING COPOLYMER, METHOD FOR PRODUCING SAME AND MOLDED BODY OF SAME Denka Company Limited (JP) 2024-12-18 EP claimed
CN-118946630-A Resin composition containing copolymer, method for producing same, and molded article 电化株式会社 2024-11-12 CN claimed
CN-113817110-B Acrylic polymer, pressure-sensitive adhesive composition, pressure-sensitive adhesive, protective film and display device 中国乐凯集团有限公司 2024-03-29 CN claimed
EP-0348800-B1 Process for preparation of modified methacrylic resin molding material MITSUBISHI RAYON CO (JP) 1993-11-03 EP claimed
US-5218069-A Indene, maleimide or maleic anhydride as monomers; heat resistance, mechanical properties KAWASAKI STEEL CORPORATION (JP) 1993-06-08 US claimed
CN-1059152-A Polyvinyl chloride with high heat distortion temperature is crossed polymkeric substance GOODRICH CO B F (US) 1992-03-04 CN claimed
US-5047188-A Process for preparation of modified methacrylic resin molding material MITSUBISHI RAYON COMPANY, LTD. (JP) 1991-09-10 US claimed
US-4990386-A Terpolymer of aromatic vinyl monomer, cyclohexylmaleimide, and acrylic compound SHOWA DENKO KABUSHIKI KAISHI (JP) 1991-02-05 US claimed
EP-0393685-A1 Imidated copolymers and uses thereof KAWASAKI STEEL CORPORATION (JP) 1990-10-24 EP claimed
EP-0390957-A1 Optical disk substrate SHOWA DENKO KABUSHIKI KAISHA (JP) 1990-10-10 EP claimed
EP-0367219-A2 Polyorganosiloxane series thermoplastic resin and composition thereof JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1990-05-09 EP claimed
EP-0355624-A2 Maleimide copolymer and a process for producing the same MITSUBISHI RAYON CO., LTD. (JP) 1990-02-28 EP claimed
EP-0348800-A1 Process for preparation of modified methacrylic resin molding material MITSUBISHI RAYON CO., LTD (JP) 1990-01-03 EP claimed