SCHEMBL2872078

SCHEMBL2872078

CO[SiH2]C(C)(c1ccccc1)c1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.46
ALDH1A1 P00352 3/20 0.43
ALOX15 P16050 1/20 0.43
MAPT P10636 1/20 0.40
KMT2A Q03164 1/20 0.40
KCNN4 O15554 4/20 0.39
TAAR1 Q96RJ0 1/20 0.38
KIF11 P52732 2/20 0.37
ESR1 P03372 2/20 0.37
ESR2 Q92731 2/20 0.37
CYP3A4 P08684 1/20 0.37
CES1 P23141 1/20 0.35
TSHR P16473 2/20 0.35
CA4 P22748 1/20 0.35
CYP2C19 P33261 1/20 0.34
HIF1A Q16665 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3836326 0.81 MAPK1 (0.46) MAPK1ALDH1A1ALOX15MAPTKMT2A
SCHEMBL706549 0.79 MAPK1 (0.44) MAPK1ALDH1A1ALOX15MAPTKMT2A
SCHEMBL11575626 0.77 MAPK1 (0.43) MAPK1ALDH1A1ALOX15MAPTKMT2A
SCHEMBL704362 0.76 MAPK1 (0.41) MAPK1ALDH1A1ALOX15MAPTKMT2A
SCHEMBL705574 0.73 MAPT (0.47) MAPK1ALDH1A1ALOX15MAPTKMT2A
SCHEMBL707097 0.72 MAPK1 (0.46) MAPK1ALDH1A1ALOX15MAPTKMT2A
Biphenyl SCHEMBL28760445 0.71 ALDH1A1 (0.43) MAPK1ALDH1A1ALOX15MAPTKMT2A
SCHEMBL706961 0.70 KCNN4 (0.44) MAPK1ALDH1A1ALOX15MAPTKMT2A
SCHEMBL705506 0.70 MAPK1 (0.44) MAPK1ALDH1A1ALOX15MAPTKMT2A
SCHEMBL5143306 0.70 MAPT (0.48) MAPK1ALDH1A1ALOX15MAPTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101641767-B Silicon dielectric treating agent for use after etching, process for producing semiconductor device, and semiconductor device FUJITSU LTD 2013-10-30 CN disclosed
CN-103249762-A Addition-curable metallosiloxane compound DAICEL CORP 2013-08-14 CN disclosed
US-7812530-B2 Flexible substrate and organic device using the same DAI NIPPON PRINTING CO., LTD. (JP) 2010-10-12 US disclosed
CN-100535054-C Silica film forming material, silica film and preparation method thereof FUJITSU LTD (JP) 2009-09-02 CN disclosed
CN-1891757-A Silica film forming material, silica film and method of manufacturing the same FUJITSU LTD (JP) 2007-01-10 CN disclosed
CN-1878735-A Flexible substrate and coating liquid SUMITOMO CORP (JP) 2006-12-13 CN disclosed
US-20050236985-A1 Flexible substrate and organic device using the same DAI NIPPON PRINTING CO., LTD. (JP) 2005-10-27 US disclosed