SCHEMBL28776239

SCHEMBL28776239

C1=CCC=C1.CCc1cc[nH]c1CC.[Ru]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27742755 0.86 HTR1A (0.32)
SCHEMBL668146 0.84
SCHEMBL7588373 0.82 HTR1A (0.32)
SCHEMBL27742663 0.80
Pyrrole SCHEMBL27742680 0.79 HTR1A (0.33)
Piperazine SCHEMBL28201327 0.79 HTR1A (0.34)
Phosphoric Acid SCHEMBL31510332 0.75 GABRA1 (0.32)
SCHEMBL27742665 0.73 PGR (0.32)
SCHEMBL9394087 0.71
SCHEMBL28117526 0.71 GPR84 (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101448977-B Apparatus and process for plasma-enhanced atomic layer deposition APPLIED MATERIALS INC 2010-12-15 CN disclosed
CN-101448977-A Apparatus and process for plasma-enhanced atomic layer deposition APPLIED MATERIALS INC (US) 2009-06-03 CN disclosed