Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RORC | P51449 | 2/20 | 0.38 |
| ▸ | RORA | P35398 | 1/20 | 0.38 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.38 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.38 |
| ▸ | CA1 | P00915 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.36 |
| ▸ | CA9 | Q16790 | 1/20 | 0.36 |
| ▸ | ERN1 | O75460 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.35 |
| ▸ | MEN1 | O00255 | 3/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.35 |
| ▸ | ACP3 | P15309 | 2/20 | 0.35 |
| ▸ | NPY1R | P25929 | 1/20 | 0.34 |
| ▸ | NPY5R | Q15761 | 1/20 | 0.34 |
| ▸ | PTPRC | P08575 | 1/20 | 0.34 |
| ▸ | SLC2A1 | P11166 | 3/20 | 0.32 |
| ▸ | HCRTR1 | O43613 | 1/20 | 0.32 |
| ▸ | F2 | P00734 | 2/20 | 0.32 |
| ▸ | PRSS1 | P07477 | 2/20 | 0.32 |
| ▸ | PRSS2 | P07478 | 2/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3876388 | 0.77 | KDM4E (0.43) | RORCRORANR1H2NR1H4CA1 | |
| SCHEMBL14111208 | 0.72 | KDM4E (0.46) | RORCRORANR1H2NR1H4CA1 | |
| SCHEMBL3871886 | 0.72 | MEN1 (0.44) | RORCRORANR1H2NR1H4CA1 | |
| SCHEMBL3249388 | 0.69 | ALDH1A1 (0.43) | KDM4EMEN1KMT2AACP3PTPRC | |
| SCHEMBL35772 | 0.68 | KEAP1 (0.43) | CA1CA2CA9KDM4EMEN1 | |
| SCHEMBL29763080 | 0.68 | KEAP1 (0.43) | CA1CA2CA9KDM4EMEN1 | |
| SCHEMBL11651931 | 0.67 | KEAP1 (0.42) | CA1CA2CA9KDM4EMEN1 | |
| 1-Naphthol SCHEMBL6306784 | 0.67 | CYP1A2 (0.65) | RORCRORANR1H2NR1H4CA1 | |
| SCHEMBL1719758 | 0.67 | KEAP1 (0.42) | CA1CA2CA9KDM4EMEN1 | |
| SCHEMBL11606350 | 0.67 | KEAP1 (0.42) | CA1CA2CA9KDM4EMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106444288-A | Chemically amplified positive resist composition and pattern forming process | 信越化学工业株式会社 | 2017-02-22 | — | — | CN | disclosed |
| CN-101625524-A | Photoresist composition and pattern forming method | SHINETSU CHEMICAL CO | 2010-01-13 | — | — | CN | disclosed |
| CN-101625523-A | Resist patterning process and manufacturing photo mask | SHINETSU CHEMICAL CO | 2010-01-13 | — | — | CN | disclosed |