SCHEMBL2881050

SCHEMBL2881050

C=C(C)C(=O)C1CCOC1=O

nearest known ligand 0.45

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 2/20 0.34
POLB P06746 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
ALDH1A1 P00352 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27364252 0.83
SCHEMBL22587457 0.80
SCHEMBL13827000 0.80
SCHEMBL26922 0.80
SCHEMBL16349426 0.79 HSD17B10 (0.37) MAPK1POLBSMN1; SMN2ALDH1A1
SCHEMBL29771045 0.78 MAPK1 (0.36) MAPK1POLBSMN1; SMN2
SCHEMBL6622386 0.78
SCHEMBL27558518 0.75 CA1 (0.32)
SCHEMBL11274062 0.74
SCHEMBL440041 0.73 FKBP1A (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106574101-B Polyester resin composition and molded article 住友精化株式会社 2020-05-05 CN disclosed
EP-1510866-B1 Image recording material and planographic printing plate FUJIFILM CORP (JP) 2016-03-09 EP disclosed
EP-1396756-B1 Planographic printing plate precursor FUJIFILM CORP (JP) 2015-12-23 EP disclosed
US-8323536-B2 Near-infrared absorbing dye, near-infrared absorptive film-forming composition, and near-infrared absorptive film SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-12-04 US disclosed
US-20120119171-A1 NEAR-INFRARED ABSORBING DYE, NEAR-INFRARED ABSORPTIVE FILM-FORMING COMPOSITION, AND NEAR-INFRARED ABSORPTIVE FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-17 US disclosed
US-7670753-B2 Lithographic printing plate precursor EASTMAN KODAK COMPANY (US) 2010-03-02 US disclosed
US-20090075201-A1 PLANOGRAPHIC PRINTING PLATE MATERIAL, AND CYCLIC UREIDE MOIETY-CONTAINING PHENOLIC RESIN AND ITS SYNTHETIC PROCESS KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2009-03-19 US disclosed
US-20090076201-A1 (METH) ACRYLOYLOXYTETRAHYDROFURANS AND PROCESS FOR PRODUCTION THEREOF MITSUBISHI CHEMICAL CORPORATION (JP) 2009-03-19 US disclosed
US-7494763-B2 Polyhydric phenol compound and chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-02-24 US disclosed
EP-1834802-B1 Infrared-sensitive lithographic printing plate FUJIFILM CORP (JP) 2009-01-14 EP disclosed
EP-1396756-A2 Planographic printing plate precursor Fuji Photo Film Co., Ltd. (JP) 2004-03-10 EP disclosed
US-6548221-B2 Comprising 2-alkyl-2-adamantyl (meth)acrylate monomer; for production of semiconductors via lithography SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-6534239-B2 Resolution lithographic performance; reduced shrinkage upon exposure and/or post-exposure bake; imaging INTERNATIONAL BUSINESS MACHINES CORPORATION 2003-03-18 US disclosed
US-20020182534-A1 Resist compositions with polymers having pendant groups containing plural acid labile moieties INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2002-12-05 US disclosed
WO-2002088077-A2 RESIST COMPOSITIONS WITH POLYMERS HAVING PENDANT GROUPS CONTAINING PLURAL ACID LABILE MOIETIES INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2002-11-07 WO disclosed
US-20020081523-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL CO., LTD. 2002-06-27 US disclosed
US-6383713-B1 ADAMANTYL ACRYLATE POLYMERS AND ACID GENERATORS SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-05-07 US disclosed
US-6348297-B1 COMPOSITION COMPRISING ACID GENERATOR COMPRISING ALIPHATIC SULFONIUM SALT, TRIPHENYLSULFONIUM OR DIPHENYLIODONIUM SALT,RESIN HAVING ACID-LABILE GROUP WHICH IS INSOLUBLE IN ALKALI BUT BECOMES SOLUBLE BY ACTION OF ACID SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-19 US disclosed
EP-1041442-A1 Chemical amplification type positive resist SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2000-10-04 EP disclosed
EP-1020767-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2000-07-19 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090076201-A1 (METH) ACRYLOYLOXYTETRAHYDROFURANS AND PROCESS FOR PRODUCTION THEREOF MTHFD2, MTR, MTHFD1 MAPK1 3210/4885POLB 2374/4885SMN1; SMN2 3664/4885
US-20120119171-A1 NEAR-INFRARED ABSORBING DYE, NEAR-INFRARED ABSORPTIVE FILM-FORMING COMPOSITION, AND NEAR-INFRARED ABSORPTIVE FILM SLCO2A1, SLC39A3, SLCO2B1 MAPK1 2952/4885POLB 3178/4885SMN1; SMN2 3133/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.