SCHEMBL28814923

SCHEMBL28814923

O=[N+]([O-])c1ccc(-c2[c]ccc(Sc3ccccc3)c2)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PDE7A Q13946 3/20 0.47
KMT2A Q03164 3/20 0.44
MAPT P10636 2/20 0.44
MEN1 O00255 2/20 0.44
ALDH1A1 P00352 3/20 0.42
LMNA P02545 1/20 0.42
MAPK1 P28482 2/20 0.41
POLB P06746 2/20 0.41
GAA P10253 1/20 0.38
PKM P14618 1/20 0.38
L3MBTL1 Q9Y468 2/20 0.38
CRHBP P24387 2/20 0.38
CRHR2 Q13324 2/20 0.38
ATM Q13315 1/20 0.38
TLR9 Q9NR96 1/20 0.38
HSP90AA1 P07900 1/20 0.38
HPGD P15428 1/20 0.38
ALOX12 P18054 1/20 0.38
TNKS O95271 1/20 0.38
PARP1 P09874 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9003412 0.81 MAOA (0.39) MAPTALDH1A1LMNAL3MBTL1HPGD
SCHEMBL3277951 0.78 APP (0.44) MAPTALDH1A1LMNAMAPK1HPGD
SCHEMBL268150 0.78 MEN1 (0.68) PDE7AKMT2AMAPTMEN1ALDH1A1
SCHEMBL10964089 0.77 CHRNA7 (0.41) PDE7AKMT2AMAPTMEN1ALDH1A1
SCHEMBL11385468 0.77 POLB (0.46) KMT2AMAPTALDH1A1LMNAMAPK1
SCHEMBL5096848 0.77 ALDH1A1 (0.47) KMT2AMAPTMEN1ALDH1A1LMNA
SCHEMBL8527445 0.76 ALDH1A1 (0.50) KMT2AMAPTMEN1ALDH1A1LMNA
SCHEMBL2935620 0.75 ALDH1A1 (0.48) KMT2AMAPTMEN1ALDH1A1LMNA
SCHEMBL5858235 0.74 ACHE (0.50) KMT2AMAPTMEN1ALDH1A1GAA
SCHEMBL3798737 0.74 ALDH1A1 (0.50) KMT2AMAPTMEN1ALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104276995-A High-photosensibility oxime ester photopolymerization initiator and photopolymerization composition containing same TAKOMA TECHNOLOGY CO LTD 2015-01-14 CN disclosed