Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | FDPS | P14324 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 2/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.31 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | CTSD | P07339 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11412698 | 0.91 | LMNA (0.39) | LMNAALDH1A1HSD17B10FDPSTSHR | |
| SCHEMBL11406496 | 0.85 | LMNA (0.33) | LMNATSHRCYP3A4NFKB1 | |
| SCHEMBL28029862 | 0.82 | MEN1 (0.33) | ALDH1A1 | |
| SCHEMBL11407135 | 0.79 | TSHR (0.34) | LMNAALDH1A1HSD17B10TSHRCYP3A4 | |
| SCHEMBL5482221 | 0.79 | HRH3 (0.33) | — | |
| SCHEMBL14885080 | 0.79 | PKM (0.38) | ALDH1A1FDPS | |
| SCHEMBL11419082 | 0.78 | HTT (0.32) | LMNAALDH1A1HSD17B10 | |
| SCHEMBL28428751 | 0.78 | HTT (0.32) | LMNAALDH1A1HSD17B10 | |
| SCHEMBL11407788 | 0.77 | FDPS (0.39) | ALDH1A1FDPSCYP3A4RAB9A | |
| SCHEMBL29091814 | 0.77 | ALDH1A1 (0.34) | LMNAALDH1A1HSD17B10TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115039029-A | Negative photosensitive resin composition and method for producing cured relief pattern | 旭化成株式会社 | 2022-09-09 | — | — | CN | disclosed |