⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18499585 | 0.79 | SCARB1 (0.32) | — | |
| SCHEMBL2742215 | 0.78 | SLC2A1 (0.32) | — | |
| SCHEMBL10204317 | 0.78 | HPGDS (0.36) | — | |
| SCHEMBL10182743 | 0.74 | CNR1 (0.32) | — | |
| SCHEMBL15450682 | 0.72 | CDC25B (0.40) | — | |
| SCHEMBL2742195 | 0.72 | TDP1 (0.36) | — | |
| SCHEMBL12040222 | 0.71 | HPGDS (0.36) | — | |
| SCHEMBL18499591 | 0.69 | — | — | |
| SCHEMBL10233184 | 0.69 | — | — | |
| SCHEMBL16638148 | 0.69 | RIPK1 (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120034559-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH | FUJIFILM CORPORATION (JP) | 2012-02-09 | — | — | US | disclosed |
| US-20120003583-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | US | disclosed |