⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1827792 | 0.89 | — | — | |
| Benzene SCHEMBL28857166 | 0.81 | TSHR (0.33) | — | |
| Benzene SCHEMBL28857204 | 0.80 | — | — | |
| SCHEMBL1829570 | 0.78 | — | — | |
| SCHEMBL2017651 | 0.76 | — | — | |
| SCHEMBL9746323 | 0.75 | TP53 (0.42) | — | |
| SCHEMBL9746825 | 0.75 | TSHR (0.39) | — | |
| Benzene SCHEMBL28857070 | 0.72 | — | — | |
| SCHEMBL1828102 | 0.69 | TSHR (0.40) | — | |
| Benzene SCHEMBL28286118 | 0.69 | TP53 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116194840-A | Photosensitive resin composition, permanent resist, method for forming permanent resist, and method for inspecting cured film for permanent resist | 株式会社力森诺科 | 2023-05-30 | — | — | CN | disclosed |
| CN-115151868-A | Photosensitive resin composition, method for sorting photosensitive resin composition, method for producing patterned cured film, and method for producing semiconductor device | 昭和电工材料株式会社 | 2022-10-04 | — | — | CN | disclosed |