SCHEMBL28872288

SCHEMBL28872288

OP(O)Oc1ccc(-c2ccccc2)c(-c2ccccc2)c1C1CCCCC1

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ADORA3 P0DMS8 2/20 0.34
▸ ADORA2B P29275 2/20 0.34
▸ ADORA1 P30542 2/20 0.34
▸ ADORA2A P29274 1/20 0.34
▸ POLB P06746 1/20 0.34
▸ CASP3 P42574 1/20 0.34
▸ SENP7 Q9BQF6 1/20 0.34
▸ SENP6 Q9GZR1 1/20 0.34
▸ CDK1 P06493 1/20 0.34
▸ CDK4 P11802 1/20 0.34
▸ CCNB1 P14635 1/20 0.34
▸ CCND1 P24385 1/20 0.34
▸ CCNE1 P24864 1/20 0.34
▸ CDK2 P24941 1/20 0.34
▸ C5AR1 P21730 2/20 0.33
▸ TDP1 Q9NUW8 1/20 0.33
▸ L3MBTL1 Q9Y468 1/20 0.33
▸ MEN1 O00255 2/20 0.33
▸ KMT2A Q03164 2/20 0.33
▸ PTGDR2 Q9Y5Y4 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3119094 0.76 BACE1 (0.34) TDP1L3MBTL1MEN1KMT2APTGDR2
SCHEMBL9779733 0.75 PTGS2 (0.40) ADORA3ADORA2BADORA1ADORA2APOLB
SCHEMBL9621135 0.72 PTGDR2 (0.35) PTGDR2ALDH1A1HPGD
SCHEMBL11250212 0.72 ESR2 (0.36) TDP1L3MBTL1MEN1KMT2APTGDR2
SCHEMBL1726399 0.71 PTGDR2 (0.43) MEN1KMT2APTGDR2
SCHEMBL31186148 0.71 ALDH1A1 (0.33) TDP1L3MBTL1ALDH1A1LMNASMN1; SMN2
SCHEMBL675482 0.70 HNF4A (0.38) TDP1L3MBTL1ALDH1A1LMNASMN1; SMN2
SCHEMBL29924556 0.70 HNF4A (0.38) TDP1L3MBTL1ALDH1A1LMNASMN1; SMN2
SCHEMBL8160159 0.69 TDP1 (0.44) TDP1L3MBTL1ALDH1A1LMNASMN1; SMN2
SCHEMBL29992101 0.69 TDP1 (0.44) TDP1L3MBTL1ALDH1A1LMNASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119439625-A Negative photosensitive resin composition, pattern forming method, cured coating film forming method, interlayer insulating film, surface protective film, and electronic component 信越化学工业株式会社 2025-02-14 — — CN disclosed
CN-115113482-A Negative photosensitive resin composition, pattern forming method, cured film forming method, interlayer insulating film, and surface protective film 信越化学工业株式会社 2022-09-27 — — CN disclosed
CN-115113484-A Positive photosensitive resin composition, positive photosensitive dry film, method for producing the same, and method for forming pattern 信越化学工业株式会社 2022-09-27 — — CN disclosed
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