SCHEMBL2887917

SCHEMBL2887917

O=C(OCCC(F)(F)C(F)(F)S(=O)(=O)OS(c1ccccc1)(c1ccccc1)c1ccccc1)C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.45
GAA P10253 2/20 0.45
RECQL P46063 1/20 0.40
KMT2A Q03164 2/20 0.39
SMN1; SMN2 Q16637 2/20 0.39
LMNA P02545 1/20 0.38
CYP17A1 P05093 2/20 0.37
CYP19A1 P11511 2/20 0.37
KDM4E B2RXH2 1/20 0.37
CYP1A2 P05177 1/20 0.37
CYP3A4 P08684 1/20 0.37
CYP2D6 P10635 1/20 0.37
CYP2C9 P11712 1/20 0.37
CYP2C19 P33261 1/20 0.37
ENPP3 O14638 1/20 0.37
CA2 P00918 1/20 0.37
ENPP1 P22413 1/20 0.37
ENPP2 Q13822 1/20 0.37
CA9 Q16790 1/20 0.37
NPC1 O15118 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL515759 0.93 ALDH1A1 (0.43) ALDH1A1GAARECQLKMT2ASMN1; SMN2
SCHEMBL14760503 0.86 ALDH1A1 (0.35) ALDH1A1GAARECQLKMT2ALMNA
SCHEMBL14760515 0.83 EPHX2 (0.34) ALDH1A1GAAKMT2ALMNATSHR
SCHEMBL1398383 0.83 ALDH1A1 (0.48) ALDH1A1GAARECQLKMT2ASMN1; SMN2
SCHEMBL14760530 0.82 ALDH1A1 (0.34) ALDH1A1GAAKMT2ALMNA
SCHEMBL13836391 0.82 ALDH1A1 (0.44) ALDH1A1GAARECQLKMT2ASMN1; SMN2
SCHEMBL3454498 0.79 ALDH1A1 (0.51) ALDH1A1GAARECQLKMT2ASMN1; SMN2
SCHEMBL2887913 0.78 ALDH1A1 (0.40) ALDH1A1GAARECQLKMT2ASMN1; SMN2
SCHEMBL1656675 0.78 TDP1 (0.44) ALDH1A1KMT2ASMN1; SMN2LMNACYP1A2
SCHEMBL3454542 0.77 ALDH1A1 (0.49) ALDH1A1GAARECQLKMT2ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9268219-B2 Photoresist composition and resist pattern-forming method JSR CORPORATION (JP) 2016-02-23 US disclosed
US-9122154-B2 Radiation-sensitive resin composition, and radiation-sensitive acid generating agent JSR CORPORATION (JP) 2015-09-01 US disclosed
US-9104102-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2015-08-11 US disclosed
US-8889336-B2 Radiation-sensitive resin composition and radiation-sensitive acid generating agent JSR CORPORATION (JP) 2014-11-18 US disclosed
US-20140154625-A9 RADIATION-SENSITIVE RESIN COMPOSITION, AND RADIATION-SENSITIVE ACID GENERATING AGENT JSR CORPORATION (JP) 2014-06-05 US disclosed
US-20130295505-A1 RADIATION-SENSITIVE RESIN COMPOSITION, AND RADIATION-SENSITIVE ACID GENERATING AGENT JSR CORP (JP) 2013-11-07 US disclosed
US-20130260316-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND RADIATION-SENSITIVE ACID GENERATING AGENT JSR CORPORATION (JP) 2013-10-03 US disclosed
US-8431324-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2013-04-30 US disclosed
US-20130089817-A1 PHOTORESIST COMPOSITION AND RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2013-04-11 US disclosed
US-20120295198-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2012-11-22 US disclosed
US-20100285405-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-11-11 US disclosed