SCHEMBL14760503

SCHEMBL14760503

O=C(OC12CC3CC(C1)CC(C(=O)OCCC(F)(F)C(F)(F)S(=O)(=O)OS(c1ccccc1)(c1ccccc1)c1ccccc1)(C3)C2)C(F)(F)F

nearest known ligand 0.35

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.35
GAA P10253 2/20 0.35
NPSR1 Q6W5P4 2/20 0.34
LMNA P02545 4/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
SCN9A Q15858 1/20 0.32
HTT P42858 1/20 0.32
MEN1 O00255 1/20 0.32
MAPT P10636 1/20 0.32
KMT2A Q03164 1/20 0.32
TP53 P04637 1/20 0.31
RECQL P46063 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2887917 0.86 ALDH1A1 (0.45) ALDH1A1GAALMNAKMT2ARECQL
SCHEMBL14760515 0.86 EPHX2 (0.34) ALDH1A1GAANPSR1LMNAL3MBTL1
SCHEMBL14760530 0.84 ALDH1A1 (0.34) ALDH1A1GAANPSR1LMNAL3MBTL1
SCHEMBL14773963 0.82 NPSR1 (0.39) ALDH1A1NPSR1L3MBTL1SCN9AMEN1
SCHEMBL14760465 0.81 NPSR1 (0.38) ALDH1A1NPSR1L3MBTL1SCN9AMEN1
SCHEMBL515759 0.80 ALDH1A1 (0.43) ALDH1A1GAALMNAKMT2ARECQL
SCHEMBL14760463 0.80 NPSR1 (0.37) ALDH1A1NPSR1SCN9A
SCHEMBL26488804 0.74 NPSR1 (0.40) ALDH1A1NPSR1L3MBTL1MEN1KMT2A
SCHEMBL14770325 0.73 LMNA (0.35) ALDH1A1GAANPSR1LMNAL3MBTL1
SCHEMBL1146838 0.72 DPP8 (0.34) ALDH1A1LMNAL3MBTL1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130244185-A9 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT JSR CORPORATION (JP) 2013-09-19 US disclosed
US-20130065186-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT JSR CORPORATION (JP) 2013-03-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130244185-A9 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT GLRA3, RER1, RXRG ALDH1A1 2289/4885GAA 1539/4885NPSR1 1899/4885
US-20130065186-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT GLRA3, RER1, FPR3 ALDH1A1 2387/4885GAA 1552/4885NPSR1 1960/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.