Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.43 |
| ▸ | GAA | P10253 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | RECQL | P46063 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | CYP17A1 | P05093 | 2/20 | 0.35 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.35 |
| ▸ | ENPP3 | O14638 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | ENPP1 | P22413 | 1/20 | 0.35 |
| ▸ | ENPP2 | Q13822 | 1/20 | 0.35 |
| ▸ | CA9 | Q16790 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2887917 | 0.93 | ALDH1A1 (0.45) | ALDH1A1GAASMN1; SMN2RECQLKMT2A | |
| SCHEMBL1771531 | 0.83 | ALDH1A1 (0.39) | ALDH1A1GAASMN1; SMN2RECQLKMT2A | |
| SCHEMBL893422 | 0.83 | ALDH1A1 (0.39) | ALDH1A1GAASMN1; SMN2RECQLKMT2A | |
| SCHEMBL17068032 | 0.81 | NPSR1 (0.38) | ALDH1A1GAAKMT2ALMNACYP17A1 | |
| SCHEMBL893421 | 0.80 | ALDH1A1 (0.41) | ALDH1A1GAASMN1; SMN2RECQLKMT2A | |
| SCHEMBL1771529 | 0.80 | ALDH1A1 (0.39) | ALDH1A1GAASMN1; SMN2RECQLKMT2A | |
| SCHEMBL1398383 | 0.80 | ALDH1A1 (0.48) | ALDH1A1GAASMN1; SMN2RECQLKMT2A | |
| SCHEMBL14760503 | 0.80 | ALDH1A1 (0.35) | ALDH1A1GAARECQLKMT2ALMNA | |
| SCHEMBL1771449 | 0.80 | RORC (0.35) | ALDH1A1SMN1; SMN2KMT2ACA2 | |
| SCHEMBL515758 | 0.80 | ALDH1A1 (0.39) | ALDH1A1GAASMN1; SMN2RECQLKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 107 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8889888-B2 | Sulfonic acid salt and derivative thereof, photo-acid generator, and process for production of sulfonic acid salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-11-18 | — | — | US | claimed |
| US-20110112306-A1 | Novel Sulfonic Acid Salt and Derivative thereof, Photo-Acid Generator, and Process for Production of Sulfonic Acid Salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-05-12 | — | — | US | claimed |
| US-12560866-B2 | Radiation-sensitive resin composition, method of forming resist pattern, polymer, and compound | JSR CORPORATION (JP) | 2026-02-24 | — | — | US | disclosed |
| US-12386260-B2 | Radiation-sensitive resin composition, method of forming resist pattern, polymer, and compound | JSR CORPORATION (JP) | 2025-08-12 | — | — | US | disclosed |
| WO-2024176973-A1 | METHOD FOR PRODUCING PURIFIED RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND PURIFIED RESIST COMPOSITION | 東京応化工業株式会社 | 2024-08-29 | — | — | WO | disclosed |
| US-20220299873-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMER, AND COMPOUND | JSR CORPORATION (JP) | 2022-09-22 | — | — | US | disclosed |
| US-20220229367-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMER, AND COMPOUND | JSR CORPORATION (JP) | 2022-07-21 | — | — | US | disclosed |
| US-11204552-B2 | Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agent | JSR CORPORATION (JP) | 2021-12-21 | — | — | US | disclosed |
| US-20210181627-A1 | PATTERN-FORMING METHOD AND RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2021-06-17 | — | — | US | disclosed |
| US-20210063872-A1 | PATTERN-FORMING METHOD AND RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2021-03-04 | — | — | US | disclosed |
| US-20200387068-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND COMPOUND | JSR CORPORATION (JP) | 2020-12-10 | — | — | US | disclosed |
| US-8431324-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2013-04-30 | — | — | US | disclosed |
| US-20130089817-A1 | PHOTORESIST COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2013-04-11 | — | — | US | disclosed |
| US-20120183902-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20120183908-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20120148952-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND | JSR CORPORATION (JP) | 2012-06-14 | — | — | US | disclosed |
| US-20120082934-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND | JSR CORPORATION (JP) | 2012-04-05 | — | — | US | disclosed |
| US-20120028189-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND COMPOUND | JSR CORPORATION (JP) | 2012-02-02 | — | — | US | disclosed |
| US-20110112306-A1 | Novel Sulfonic Acid Salt and Derivative thereof, Photo-Acid Generator, and Process for Production of Sulfonic Acid Salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-05-12 | — | — | US | disclosed |
| US-20100285405-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-11-11 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (8 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120148952-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND | RAD1, RER1, RPA1 | ALDH1A1 806/4885GAA 2742/4885SMN1; SMN2 1552/4885 |
| US-20120082934-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND | RER1, RFT1, RAD51 | ALDH1A1 1635/4885GAA 2512/4885SMN1; SMN2 3699/4885 |
| US-20120028189-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND COMPOUND | RER1, RAD51, TERB1 | ALDH1A1 1091/4885GAA 2487/4885SMN1; SMN2 3842/4885 |
| US-11204552-B2 | Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agent | NOS1, ADCY1, IFNAR1 | ALDH1A1 243/4885GAA 4232/4885SMN1; SMN2 3352/4885 |
| US-20210181627-A1 | PATTERN-FORMING METHOD AND RADIATION-SENSITIVE COMPOSITION | RIF1, AP3M1, MRE11 | ALDH1A1 3272/4885GAA 4547/4885SMN1; SMN2 2562/4885 |
| US-20110112306-A1 | Novel Sulfonic Acid Salt and Derivative thereof, Photo-Acid Generator, and Process for Production of Sulfonic Acid Salt | ASIC1, FGFR1, PFAS | ALDH1A1 1719/4885GAA 1616/4885SMN1; SMN2 2668/4885 |
| US-12560866-B2 | Radiation-sensitive resin composition, method of forming resist pattern, polymer, and compound | RAD51, RER1, RAD1 | ALDH1A1 345/4885GAA 3515/4885SMN1; SMN2 926/4885 |
| US-20220299873-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMER, AND COMPOUND | RER1, RAD51, RFT1 | ALDH1A1 1243/4885GAA 3151/4885SMN1; SMN2 724/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.