SCHEMBL2888952

SCHEMBL2888952

C[Si](C)(C#Cc1ccc2c(c1)CC2)O[Si](C)(C)C#Cc1ccc2c(c1)CC2

nearest known ligand 0.33

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
GRM5 P41594 2/20 0.33
DRD2 P14416 2/20 0.32
DRD3 P35462 2/20 0.32
PNMT P11086 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9014691 0.83 GABRA1 (0.35) GRM5DRD2DRD3PNMT
SCHEMBL7085122 0.76 GRM5 (0.38) GRM5DRD2DRD3PNMT
SCHEMBL15700221 0.69 APP (0.48) GRM5
SCHEMBL4517248 0.68 PIK3CD (0.34)
SCHEMBL10669403 0.67 GRM5 (0.62) GRM5
SCHEMBL4523627 0.66 CYP1A2 (0.48)
SCHEMBL7085730 0.65 GRM5 (0.62) GRM5
SCHEMBL9014737 0.63 TYMS (0.40) GRM5DRD2DRD3PNMT
SCHEMBL3949559 0.63 APP (0.35) GRM5
SCHEMBL9024457 0.62 BRAF (0.40) GRM5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7704872-B2 Ultraviolet assisted pore sealing of porous low k dielectric films AXCELIS TECHNOLOGIES, INC. (US) 2010-04-27 US disclosed
US-7678682-B2 Ultraviolet assisted pore sealing of porous low k dielectric films AXCELIS TECHNOLOGIES, INC. (US) 2010-03-16 US disclosed
US-7629272-B2 Ultraviolet assisted porogen removal and/or curing processes for forming porous low k dielectrics AXCELIS TECHNOLOGIES, INC. (US) 2009-12-08 US disclosed
US-20070134935-A1 Ultraviolet assisted pore sealing of porous low K dielectric films AXCELIS TECHNOLOGIES, INC. 2007-06-14 US disclosed
US-7109249-B2 Composition containing a cross-linkable matrix precursor and a poragen, and porous matrix prepared therefrom DOW GLOBAL TECHNOLOGIES INC. (US) 2006-09-19 US disclosed
US-20060105566-A1 Ultraviolet assisted pore sealing of porous low k dielectric films AXCELIS TECHNOLOGIES, INC. 2006-05-18 US disclosed
EP-1141128-B1 A COMPOSITION CONTAINING A CROSS-LINKABLE MATRIX PRECURSOR AND A PORAGEN, AND A POROUS MATRIX PREPARED THEREFROM DOW GLOBAL TECHNOLOGIES INC (US) 2006-04-12 EP disclosed
US-6998148-B1 Porous materials SHIPLEY COMPANY, L.L.C. (US) 2006-02-14 US disclosed
US-20060024976-A1 Ultraviolet assisted porogen removal and/or curing processes for forming porous low k dielectrics AXCELIS TECHNOLOGIES, INC. 2006-02-02 US disclosed
US-20050255710-A1 Porous materials SHIPLEY COMPANY, L.L.C. (US) 2005-11-17 US disclosed
US-6887910-B2 Composition containing a cross-linkable matrix precursor and a poragen, and a porous matrix prepared therefrom DOW GLOBAL TECHNOLOGIES INC. (US) 2005-05-03 US disclosed
US-20050014855-A1 Composition containing a cross-linkable matrix precursor and a poragen, and a porous matrix prepared therefrom BRUZA KENNETH J (US) 2005-01-20 US disclosed
US-6653358-B2 Electronics; integrated circuits; containing benzocyclobutene polymer DOW GLOBAL TECHNOLOGIES INC. 2003-11-25 US disclosed
US-6630520-B1 Matrix precursor comprises a material selected from cyclopentadienone and acetylene functional compounds, at least some of which have three or more reactive functional groups; partially polymerized reaction products and perfluoroethylenes DOW GLOBAL TECHNOLOGIES INC. 2003-10-07 US disclosed
US-20030092785-A1 Composition containing a cross-linkable matrix precursor and a poragen, and a porous matrix prepared therefrom BRUZA KENNETH J (US) 2003-05-15 US disclosed
US-20030083392-A1 Composition containing a cross-linkable matrix precursor and a poragen, and a porous matrix prepared therefrom BRUZA KENNETH J (US) 2003-05-01 US disclosed
EP-0700534-B1 PARTIALLY POLYMERIZED RESINS DOW CHEMICAL CO (US) 2000-05-31 EP disclosed