SCHEMBL28889706

SCHEMBL28889706

COCO[Si](CCOCc1ccccc1)(OC)OC

nearest known ligand 0.42

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.42
TDP1 Q9NUW8 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
NAAA Q02083 1/20 0.36
SMN1; SMN2 Q16637 3/20 0.35
HTT P42858 1/20 0.35
HRH4 Q9H3N8 1/20 0.35
HRH3 Q9Y5N1 1/20 0.35
ALDH1A1 P00352 3/20 0.35
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34
LTA4H P09960 1/20 0.34
CYP1A2 P05177 1/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2C19 P33261 1/20 0.33
VCP P55072 1/20 0.33
TAAR1 Q96RJ0 1/20 0.33
LMNA P02545 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1968087 0.80 TDP1 (0.38) TDP1L3MBTL1SMN1; SMN2ALDH1A1TAAR1
SCHEMBL3345351 0.78 IDO1 (0.38) L3MBTL1ALDH1A1MEN1KMT2ALMNA
SCHEMBL10966011 0.77 L3MBTL1 (0.54) TSHRTDP1L3MBTL1NAAASMN1; SMN2
SCHEMBL1972981 0.76 LTA4H (0.34) TSHRL3MBTL1ALDH1A1LTA4HTAAR1
SCHEMBL6757468 0.76 TSHR (0.56) TSHRTDP1L3MBTL1NAAASMN1; SMN2
SCHEMBL17181100 0.74 TSHR (0.41) TSHRTDP1L3MBTL1HTTALDH1A1
SCHEMBL3127292 0.73 TSHR (0.64) TSHRTDP1L3MBTL1ALDH1A1KMT2A
SCHEMBL29460875 0.72 TSHR (0.56) TSHRTDP1L3MBTL1NAAASMN1; SMN2
SCHEMBL155729 0.72 TSHR (0.61) TSHRTDP1L3MBTL1NAAASMN1; SMN2
SCHEMBL27716226 0.71 TSHR (0.40) TSHRTDP1L3MBTL1ALDH1A1LTA4H

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111226175-A Method for manufacturing semiconductor device using silicon-containing resist underlayer film-forming composition containing organic group having ammonium group 日产化学株式会社 2020-06-02 CN disclosed