SCHEMBL2889415

SCHEMBL2889415

COc1cc2ccccc2c(OC)c1OC

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOA P21397 2/20 0.58
NQO1 P15559 1/20 0.52
SMN1; SMN2 Q16637 3/20 0.51
NPC1 O15118 1/20 0.51
PTGES O14684 1/20 0.51
ALOX5 P09917 1/20 0.51
ALDH1A1 P00352 3/20 0.50
KDM4E B2RXH2 3/20 0.50
MAPK1 P28482 1/20 0.50
ERN1 O75460 1/20 0.49
MAPT P10636 3/20 0.48
POLB P06746 3/20 0.46
TUBB4A P04350 2/20 0.46
TUBB P07437 2/20 0.46
TUBA3C P0DPH7 2/20 0.46
TUBA1B P68363 2/20 0.46
TUBA4A P68366 2/20 0.46
TUBB4B P68371 2/20 0.46
TUBB3 Q13509 2/20 0.46
TUBB2A Q13885 2/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27423013 0.98 MAOA (0.56) MAOANQO1SMN1; SMN2NPC1PTGES
SCHEMBL2633152 0.84 PTGES (0.49) MAOANQO1SMN1; SMN2NPC1PTGES
SCHEMBL19612255 0.83 NQO1 (0.44) MAOANQO1SMN1; SMN2PTGESALOX5
SCHEMBL10895815 0.83 HTT (0.49) NQO1SMN1; SMN2NPC1PTGESALOX5
SCHEMBL24536227 0.82 NQO1 (0.47) MAOANQO1SMN1; SMN2NPC1PTGES
SCHEMBL8082067 0.82 ERN1 (0.61) NQO1SMN1; SMN2PTGESALOX5ALDH1A1
SCHEMBL29679855 0.82 NQO1 (0.47) MAOANQO1SMN1; SMN2NPC1PTGES
SCHEMBL5460840 0.82 NQO1 (0.47) MAOANQO1SMN1; SMN2NPC1PTGES
SCHEMBL6681989 0.82 MAPT (0.55) MAOANQO1SMN1; SMN2PTGESALOX5
SCHEMBL2328658 0.82 PTGES (0.48) MAOANQO1SMN1; SMN2NPC1PTGES

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116642873-A Reusable SERS (surface enhanced Raman Scattering) sensing chip and preparation method and application thereof 江南大学 2023-08-25 CN claimed
CN-1265645-A Urokinase inhibitors ABBOTT LAB (US) 2000-09-06 CN claimed
EP-0188248-B1 NAPHTHALENE DERIVATIVES, PROCESS FOR THE PREPARATION THEREOF AND PHARMACEUTICAL COMPOSITION CONTAINING SAME TANABE SEIYAKU CO., LTD. (JP) 1990-07-11 EP claimed
CN-116642873-A Reusable SERS (surface enhanced Raman Scattering) sensing chip and preparation method and application thereof 江南大学 2023-08-25 CN disclosed
US-20170336728-A1 ULTRAVIOLET CURABLE LIQUID COMPOSITION, ULTRAVIOLET CURING INKJET INK, ULTRAVIOLET CURING WET ELECTROPHOTOGRAPHIC LIQUID DEVELOPER, ULTRAVIOLET CURING ELECTROSTATIC INKJET INK, AND IMAGE FORMING METHOD USING THEREOF CANON KABUSHIKI KAISHA (JP) 2017-11-23 US disclosed
EP-3242897-A1 ULTRAVIOLET CURABLE LIQUID COMPOSITION, ULTRAVIOLET CURING INKJET INK, ULTRAVIOLET CURING WET ELECTROPHOTOGRAPHIC LIQUID DEVELOPER, ULTRAVIOLET CURING ELECTROSTATIC INKJET INK, AND IMAGE FORMING METHOD USING THEREOF C/o Canon Kabushiki Kaisha (JP) 2017-11-15 EP disclosed
CN-107108774-A Ultra-violet solidified fluid composition, the uv-curing type ink jet ink using it, ultraviolet hardening wet type electrophotographic liquid developer, ultraviolet hardening electrostatic inkjet ink and image forming method 佳能株式会社 2017-08-29 CN disclosed
WO-2016111380-A1 ULTRAVIOLET CURABLE LIQUID COMPOSITION, ULTRAVIOLET CURING INKJET INK, ULTRAVIOLET CURING WET ELECTROPHOTOGRAPHIC LIQUID DEVELOPER, ULTRAVIOLET CURING ELECTROSTATIC INKJET INK, AND IMAGE FORMING METHOD USING THEREOF CANON KABUSHIKI KAISHA (JP) 2016-07-14 WO disclosed
CN-104059045-B Water solublity α-naphthoflavene 01 derivatives and preparation method thereof, purposes 上海交通大学 2016-07-06 CN disclosed
CN-104059045-A Water-soluble alpha-naphthoflavone alcohol derivative as well as preparation method and application thereof UNIV SHANGHAI JIAOTONG 2014-09-24 CN disclosed
US-8697330-B2 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-04-15 US disclosed
CN-1022185-C Process for preparing analgesic carboxylic acid amide derivatives SANKYO CO (JP) 1993-09-22 CN disclosed
EP-0356247-B1 ANALGESIC CARBOXYLIC ACID AMIDE DERIVATIVES Sankyo Company Limited (JP) 1993-03-17 EP disclosed
US-5021413-A Analgesic thiomorpholins their preparation, and pharmaceutical compositions containing them SANKYO COMPANY LIMITED (JP) 1991-06-04 US disclosed
CN-1044649-A Naphthalene derivatives and synthetic intermediates preparation thereof TANABE SEIYAKU CO (JP) 1990-08-15 CN disclosed
CN-1044456-A A kind of preparation method of naphthalene derivatives TANABE SEIYAKU CO (JP) 1990-08-08 CN disclosed
CN-1040791-A ANALGESIC CARBOXYLIC ACID AMIDE DERIVATIVES SANKYO CO (JP) 1990-03-28 CN disclosed
EP-0356247-A1 Analgesic carboxylic acid amide derivatives Sankyo Company Limited (JP) 1990-02-28 EP disclosed
CN-1006464-B PROCESS FOR PREPARING NAPHTHALENE DERIVATIVES TANABE SEIYAKU CO (JP) 1990-01-17 CN disclosed
CN-86100090-A The preparation method of naphthalene derivatives 1986-08-20 CN disclosed