SCHEMBL28895645

SCHEMBL28895645

CCC1C=C(C(=O)c2ccccc2)C=CC1(C)CC

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
ALDH1A1 P00352 7/20 0.36
SMN1; SMN2 Q16637 3/20 0.36
HPGD P15428 3/20 0.35
RAB9A P51151 2/20 0.35
HPGDS O60760 1/20 0.34
L3MBTL1 Q9Y468 3/20 0.34
ALOX15 P16050 1/20 0.34
HTT P42858 1/20 0.34
ELANE P08246 1/20 0.33
LMNA P02545 1/20 0.33
CES2 O00748 1/20 0.33
CES1 P23141 1/20 0.33
RECQL P46063 1/20 0.32
PGR P06401 1/20 0.32
ADRA2A P08913 1/20 0.32
ADRA2B P18089 1/20 0.32
HTR2A P28223 1/20 0.32
HRH1 P35367 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28541856 0.82 ALDH1A1 (0.37) MEN1KMT2AALDH1A1SMN1; SMN2HPGD
SCHEMBL6657774 0.72 L3MBTL1 (0.37) MEN1KMT2AALDH1A1SMN1; SMN2HPGD
SCHEMBL28572908 0.71 CES2 (0.40) ALDH1A1CES2CES1KCNH2
SCHEMBL11227122 0.71 ALDH1A1 (0.39) MEN1KMT2AALDH1A1SMN1; SMN2HPGD
SCHEMBL29183161 0.70 ALDH1A1 (0.38) MEN1KMT2AALDH1A1SMN1; SMN2HPGD
SCHEMBL27954434 0.69 MAPK1 (0.38) MEN1KMT2AALDH1A1SMN1; SMN2HPGD
SCHEMBL28552569 0.68 ALDH1A1 (0.39) MEN1KMT2AALDH1A1SMN1; SMN2HPGD
SCHEMBL16830741 0.66 ALDH1A1 (0.45) MEN1KMT2AALDH1A1SMN1; SMN2HPGD
SCHEMBL27920589 0.66 ABCC9 (0.35) MEN1KMT2AALDH1A1SMN1; SMN2HPGD
SCHEMBL27617526 0.66 ALDH1A1 (0.37) ALDH1A1SMN1; SMN2HPGDRAB9AHPGDS

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111433297-A Film-printable ultraviolet-curable ink composition, method for producing frame pattern, and display substrate 株式会社LG化学 2020-07-17 CN disclosed