SCHEMBL28950893

SCHEMBL28950893

C1COC1.CCNNC(N)=O

nearest known ligand 0.34

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
HTT P42858 1/20 0.34
ALDH1A1 P00352 1/20 0.30
MAPK1 P28482 1/20 0.30
PKM P14618 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1749997 0.86
Hydrochloric Acid SCHEMBL901605 0.84
Dimethylamine SCHEMBL10862758 0.81 LMNA (0.33) PKM
Diethylamine SCHEMBL10859243 0.79 TP53 (0.40)
SCHEMBL2961180 0.67
Urea SCHEMBL1831870 0.66
SCHEMBL19639641 0.65 HDAC3 (0.33) ALDH1A1
SCHEMBL6836191 0.65 LMNA (0.39) ALDH1A1
SCHEMBL11293176 0.64
Urethane SCHEMBL541145 0.64 ALOX15 (0.71) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115039029-A Negative photosensitive resin composition and method for producing cured relief pattern 旭化成株式会社 2022-09-09 CN disclosed