SCHEMBL28985644

SCHEMBL28985644

CN(C)CCC(C)(N)N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4561479 0.81
SCHEMBL12643468 0.80 ALDH1A1 (0.50)
Hydrochloric Acid SCHEMBL6744498 0.79 HTR1A (0.36)
Hydrochloric Acid SCHEMBL18339962 0.79 HTR1A (0.36)
SCHEMBL2030031 0.78
SCHEMBL19135816 0.75 HTR1A (0.33)
SCHEMBL13270248 0.73 DRD2 (0.41)
SCHEMBL374859 0.73
SCHEMBL15052995 0.73 CA12 (0.47)
Propane SCHEMBL1573724 0.73 DNM1 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115958525-A Polishing pad and method for manufacturing semiconductor device using the same SKC索密思株式会社 2023-04-14 CN disclosed