SCHEMBL2898682

SCHEMBL2898682

CCOCCOC=Cc1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RELA Q04206 1/20 0.46
CHRNA7 P36544 6/20 0.38
MEN1 O00255 3/20 0.38
KMT2A Q03164 3/20 0.38
CYP1A2 P05177 2/20 0.38
KDM4E B2RXH2 2/20 0.38
ALDH1A1 P00352 2/20 0.38
MAPT P10636 1/20 0.38
TP53 P04637 1/20 0.38
CYP2D6 P10635 1/20 0.38
HPGD P15428 1/20 0.38
ALOX15 P16050 1/20 0.38
HSD17B10 Q99714 1/20 0.38
CHRNB4 P30926 4/20 0.37
CHRNA3 P32297 4/20 0.37
CHRNA10 Q9GZZ6 3/20 0.37
CHRNA9 Q9UGM1 3/20 0.37
CTDSP1 Q9GZU7 2/20 0.37
CHRNB2 P17787 1/20 0.37
APOBEC3A P31941 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7514398 0.92 RELA (0.40) RELACHRNA7MEN1KMT2ACYP1A2
SCHEMBL5373678 0.89 RELA (0.43) RELACHRNA7MEN1KMT2ACYP1A2
SCHEMBL4543864 0.87 RELA (0.41) RELACHRNA7MEN1KMT2ACYP1A2
SCHEMBL13686299 0.86 MAOB (0.48) RELACHRNA7MEN1KMT2ACYP1A2
SCHEMBL11212657 0.84 ALDH1A1 (0.47) RELACHRNA7MEN1KMT2ACYP1A2
SCHEMBL28174614 0.83 LTA4H (0.40) RELACHRNA7MEN1KMT2AALDH1A1
SCHEMBL2098848 0.82 RELA (0.46) RELACHRNA7MEN1KMT2ACYP1A2
SCHEMBL60042 0.82 RELA (0.53) RELACHRNA7MEN1KMT2ACYP1A2
Benzene SCHEMBL28121960 0.82 RELA (0.53) RELACHRNA7MEN1KMT2ACYP1A2
SCHEMBL17836905 0.82 RELA (0.53) RELACHRNA7MEN1KMT2ACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118732392-A Photoresist composition and preparation method thereof 万华化学集团股份有限公司 2024-10-01 CN claimed
CN-118295208-A Chemical amplification type photoresist and preparation method and application thereof 万华化学集团股份有限公司 2024-07-05 CN claimed
EP-1465877-B1 POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING AZ ELECTRONIC MATERIALS USA (US) 2008-09-24 EP claimed
US-6887877-B2 Compounds and methods for the treatment or prevention of Flavivirus infections VIROCHEM PHARMA INC. (CA) 2005-05-03 US claimed
EP-1395571-A1 COMPOUNDS AND METHODS FOR THE TREATMENT OR PREVENTION OF FLAVIVIRUS INFECTIONS Shire Biochem Inc. (CA) 2004-03-10 EP claimed
US-20030229053-A1 Compounds and methods for the treatment or prevention of flavivirus infections SHIRE BIOCHEM INC. (CA) 2003-12-11 US claimed
WO-2002100846-A1 COMPOUNDS AND METHODS FOR THE TREATMENT OR PREVENTION OF FLAVIVIRUS INFECTIONS SHIRE BIOCHEM INC. (CA) 2002-12-19 WO claimed
CN-119126488-A Resist topcoat composition and method of forming pattern using the same 三星SDI株式会社 2024-12-13 CN disclosed
CN-118732392-A Photoresist composition and preparation method thereof 万华化学集团股份有限公司 2024-10-01 CN disclosed
CN-118295208-A Chemical amplification type photoresist and preparation method and application thereof 万华化学集团股份有限公司 2024-07-05 CN disclosed
CN-105474099-B Laminated body 富士胶片株式会社 2019-09-03 CN disclosed
CN-109791359-A Anti-corrosion agent composition and resist pattern forming method, high-molecular compound and copolymer 东京应化工业株式会社 2019-05-21 CN disclosed
CN-105474099-A Laminate body FUJIFILM CORP 2016-04-06 CN disclosed
EP-1143296-A2 Method for forming pattern MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD (JP) 2001-10-10 EP disclosed
US-6210859-B1 SENSITIVITY, RESOLUTION, HEAT-RESISTANCE AND STABILITY AFTER EXPOSURE, ULTRAFINE PATTERNS CAN BE FORMED IRRESPECTIVE OF ANY SUBSTRATE, LARGER SCOPE OF EXPOSURE CAN BE OBTAINED, A MODIFIEDPOLYHYDROXYSTYRENE COPOLYMER KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2001-04-03 US disclosed
EP-1059563-A1 Agent for reducing substrate dependence of resist Wako Pure Chemical Industries, Ltd. (JP) 2000-12-13 EP disclosed
EP-1059314-A1 A resist composition Wako Pure Chemical Industries, Ltd. (JP) 2000-12-13 EP disclosed
US-5856069-A T-SHAPED PATTERN MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1999-01-05 US disclosed
US-5756262-A COATING SUBSTRATE, EXPOSURE THROUGH MASK IN PREFERENTIAL HUMIDITY SETTING, DEVELOPMENT MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1998-05-26 US disclosed
EP-0747767-A2 Method for forming pattern MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1996-12-11 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030229053-A1 Compounds and methods for the treatment or prevention of flavivirus infections HAVCR2, ZC3HAV1, MAVS RELA 1915/4885CHRNA7 4802/4885MEN1 2490/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.