SCHEMBL29017100

SCHEMBL29017100

CCN(CC)c1ccc(C=C2NCCC(C)C2=O)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 9/20 0.52
▸ KMT2A Q03164 9/20 0.52
▸ MAPT P10636 5/20 0.52
▸ LMNA P02545 3/20 0.52
▸ GSK3B P49841 1/20 0.52
▸ CRHBP P24387 2/20 0.45
▸ CRHR2 Q13324 2/20 0.45
▸ ALDH1A1 P00352 9/20 0.45
▸ NPSR1 Q6W5P4 2/20 0.45
▸ KDM4E B2RXH2 2/20 0.45
▸ GAA P10253 1/20 0.45
▸ MAPK1 P28482 1/20 0.45
▸ NTSR1 P30989 1/20 0.45
▸ TDP1 Q9NUW8 1/20 0.45
▸ ALDH3A1 P30838 1/20 0.44
▸ ALDH1A3 P47895 1/20 0.44
▸ SIRT2 Q8IXJ6 1/20 0.43
▸ SIRT1 Q96EB6 1/20 0.43
▸ HPGD P15428 4/20 0.42
▸ RECQL P46063 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6660662 0.78 MEN1 (0.54) MEN1KMT2AMAPTLMNAGSK3B
SCHEMBL29043634 0.73 ALDH1A1 (0.42) MEN1KMT2AMAPTLMNAGSK3B
SCHEMBL8613520 0.70 MEN1 (0.51) MEN1KMT2AMAPTLMNAGSK3B
SCHEMBL8956543 0.70 MEN1 (0.61) MEN1KMT2AMAPTLMNAGSK3B
SCHEMBL8218253 0.69 GSK3B (1.00) MEN1KMT2AMAPTLMNAGSK3B
SCHEMBL16685431 0.69 GSK3B (1.00) MEN1KMT2AMAPTLMNAGSK3B
SCHEMBL16685430 0.69 GSK3B (1.00) MEN1KMT2AMAPTLMNAGSK3B
SCHEMBL9140171 0.68 MEN1 (0.54) MEN1KMT2AMAPTLMNAGSK3B
SCHEMBL2775363 0.68 MAPT (0.56) MEN1KMT2AMAPTLMNAGSK3B
SCHEMBL355427 0.68 MAPT (0.56) MEN1KMT2AMAPTLMNAGSK3B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116075777-A Method for producing cured product, method for producing laminate, and method for producing semiconductor device 富士胶片株式会社 2023-05-05 — — CN disclosed
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