SCHEMBL29022929

SCHEMBL29022929

CC1(C)C(OC(=O)c2ccccc2)CCN(O)C1(C)C

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.49
MEN1 O00255 1/20 0.49
GAA P10253 1/20 0.46
CHRNA7 P36544 2/20 0.45
HTR3E A5X5Y0 1/20 0.45
HTR3B O95264 1/20 0.45
HTR3A P46098 1/20 0.45
HTR3D Q70Z44 1/20 0.45
HTR3C Q8WXA8 1/20 0.45
TSHR P16473 2/20 0.44
SCN1A P35498 1/20 0.43
SCN2A Q99250 1/20 0.43
SCN3A Q9NY46 1/20 0.43
CARM1 Q86X55 1/20 0.42
PRMT6 Q96LA8 1/20 0.42
CHRM2 P08172 1/20 0.41
CHRM4 P08173 1/20 0.41
CHRM1 P11229 1/20 0.41
CHRM3 P20309 1/20 0.41
APOBEC3A P31941 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28501020 0.86 MEN1 (0.52) KMT2AMEN1GAACHRNA7HTR3E
SCHEMBL5031208 0.86 KMT2A (0.49) KMT2AMEN1GAACHRNA7HTR3E
Benzoic Acid SCHEMBL28449507 0.77 ACHE (0.42) KMT2AMEN1GAATSHR
SCHEMBL9370902 0.72 TSHR (0.47) KMT2AMEN1GAACHRNA7HTR3E
SCHEMBL7629696 0.71 TSHR (0.56) KMT2AMEN1GAACHRNA7HTR3E
SCHEMBL28699769 0.71 GAA (0.50) KMT2AMEN1GAACHRNA7HTR3E
SCHEMBL3722353 0.69 TSHR (0.47) KMT2AMEN1GAACHRNA7HTR3E
SCHEMBL309536 0.69 MAPT (0.78) KMT2AMEN1GAAMAPTCYP2C19
SCHEMBL29022975 0.69 MAPT (0.78) KMT2AMEN1GAAMAPTCYP2C19
SCHEMBL7629693 0.69 TSHR (0.56) KMT2AMEN1GAACHRNA7HTR3E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115461402-B Polyethylene homopolymer composition with balanced properties 诺瓦化学品(国际)股份有限公司 2024-03-26 CN disclosed
CN-117355501-A Methyl methacrylate-containing composition, method for preserving methyl methacrylate-containing composition, and method for producing methyl methacrylate polymer 三菱化学株式会社 2024-01-05 CN disclosed
CN-117279960-A Methyl methacrylate-containing composition and method for producing methyl methacrylate polymer 三菱化学株式会社 2023-12-22 CN disclosed
CN-117242103-A Methyl methacrylate-containing composition and method for producing methyl methacrylate polymer 三菱化学株式会社 2023-12-15 CN disclosed
CN-117242105-A Methyl methacrylate-containing composition and method for producing methyl methacrylate polymer 三菱化学株式会社 2023-12-15 CN disclosed
CN-117203245-A Methyl methacrylate-containing composition and method for producing methyl methacrylate polymer 三菱化学株式会社 2023-12-08 CN disclosed
CN-117203249-A Composition containing methyl methacrylate 三菱化学株式会社 2023-12-08 CN disclosed
CN-109312200-B Heat-curable conductive adhesive 三键有限公司 2023-11-17 CN disclosed
CN-113501779-B Method for selectively removing benzyl, allyl and propargyl protecting groups by visible light or near visible light 云南大学 2023-06-23 CN disclosed
CN-116041382-A Method for producing organosilicon compounds containing (meth) acryloxy groups 信越化学工业株式会社 2023-05-02 CN disclosed
CN-115461402-A Polyethylene homopolymer compositions with balanced properties 诺瓦化学品(国际)股份有限公司 2022-12-09 CN disclosed