SCHEMBL19809195

SCHEMBL19809195

CCOc1cc(CC)c(OCC)c2ccccc12

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ SLC2A1 P11166 3/20 0.50
▸ MAPT P10636 2/20 0.47
▸ NPSR1 Q6W5P4 2/20 0.47
▸ L3MBTL1 Q9Y468 2/20 0.47
▸ ALDH1A1 P00352 4/20 0.44
▸ KDM4E B2RXH2 1/20 0.44
▸ TSHR P16473 4/20 0.40
▸ LMNA P02545 2/20 0.40
▸ HPGD P15428 1/20 0.40
▸ ALOX12 P18054 1/20 0.40
▸ NTSR1 P30989 1/20 0.40
▸ CCR6 P51684 1/20 0.40
▸ MCL1 Q07820 1/20 0.40
▸ GLA P06280 1/20 0.40
▸ SYK P43405 1/20 0.39
▸ ADORA2A P29274 1/20 0.39
▸ ADORA1 P30542 1/20 0.39
▸ TLR8 Q9NR97 1/20 0.39
▸ ESR1 P03372 1/20 0.39
▸ ESR2 Q92731 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29779703 1.00 SLC2A1 (0.50) SLC2A1MAPTNPSR1L3MBTL1ALDH1A1
SCHEMBL29025187 0.83 SLC2A1 (0.50) SLC2A1MAPTNPSR1L3MBTL1ALDH1A1
SCHEMBL12604011 0.80 HTT (0.47) SLC2A1MAPTNPSR1L3MBTL1ALDH1A1
SCHEMBL5400598 0.79 SLC2A1 (0.43) SLC2A1MAPTNPSR1L3MBTL1ALDH1A1
SCHEMBL19612386 0.79 SYK (0.52) SLC2A1MAPTNPSR1ALDH1A1KDM4E
SCHEMBL30504004 0.79 SYK (0.52) SLC2A1MAPTNPSR1ALDH1A1KDM4E
SCHEMBL12603983 0.79 L3MBTL1 (0.44) SLC2A1MAPTL3MBTL1ALDH1A1KDM4E
SCHEMBL9971029 0.76 PKM (0.53) SLC2A1ALDH1A1KDM4EMCL1SMN1; SMN2
SCHEMBL28614949 0.76 ADORA1 (0.47) SLC2A1MAPTNPSR1L3MBTL1ALDH1A1
SCHEMBL51657 0.76 ALDH1A1 (0.50) SLC2A1MAPTNPSR1L3MBTL1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116830039-A Photosensitive resin composition, photosensitive resin sheet, cured product, hollow structure, electronic component, and elastic wave filter 东丽株式会社 2023-09-29 — — CN disclosed
WO-2023153390-A1 PHOTOSENSITIVE RESIN SHEET, CURED FILM, AND MULTILAYER WIRING SUBSTRATE 東レ株式会社 2023-08-17 — — WO disclosed
CN-116360211-A Chemically amplified positive photosensitive resin composition, protective film, and element having protective film 奇美实业股份有限公司 2023-06-30 — — CN disclosed
CN-114730127-B Photosensitive resin composition, photosensitive resin sheet, hollow structure, cured product, method for producing hollow structure, electronic component, and elastic wave filter 东丽株式会社 2023-05-12 — — CN disclosed
US-11613509-B2 Radical polymerization control agent and radical polymerization control method KAWASAKI KASEI CHEMICALS LTD. (JP) 2023-03-28 — — US disclosed
CN-110891980-B Radical polymerization control agent and radical polymerization control method 川崎化成工业株式会社 2022-09-30 — — CN disclosed
WO-2022163610-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN SHEET, CURED PRODUCT, HOLLOW STRUCTURE, ELECTRONIC COMPONENT, AND ELASTIC WAVE FILTER 東レ株式会社 2022-08-04 — — WO disclosed
CN-114730127-A Photosensitive resin composition, photosensitive resin sheet, hollow structure, cured product, method for producing hollow structure, electronic component, and elastic wave filter 东丽株式会社 2022-07-08 — — CN disclosed
CN-107407871-B Photosensitive resin composition, photosensitive resin composition film, cured product, insulating film, and multilayer wiring board 东丽株式会社 2021-09-03 — — CN disclosed
US-20210122692-A1 RADICAL POLYMERIZATION CONTROL AGENT AND RADICAL POLYMERIZATION CONTROL METHOD KAWASAKI KASEI CHEMICALS LTD. (JP) 2021-04-29 — — US disclosed
CN-110891980-A Radical polymerization control agent and radical polymerization control method 川崎化成工业株式会社 2020-03-17 — — CN disclosed
US-10474031-B2 Photosensitive resin composition, photosensitive resin composition film, cured product, insulating film and multilayer wiring board TORAY INDUSTRIES, INC. (JP) 2019-11-12 — — US disclosed
US-20180052391-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED PRODUCT, INSULATING FILM AND MULTILAYER WIRING BOARD TORAY INDUSTRIES, INC. (JP) 2018-02-22 — — US disclosed
EP-3276414-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED PRODUCT, INSULATING FILM AND MULTILAYER WIRING BOARD Toray Industries, Inc. (JP) 2018-01-31 — — EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11613509-B2 Radical polymerization control agent and radical polymerization control method PPOX, NOX4, CROCC SLC2A1 4456/4885MAPT 188/4885NPSR1 4687/4885
US-20210122692-A1 RADICAL POLYMERIZATION CONTROL AGENT AND RADICAL POLYMERIZATION CONTROL METHOD PPOX, NOX4, CROCC SLC2A1 4456/4885MAPT 188/4885NPSR1 4687/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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