SCHEMBL29028353

SCHEMBL29028353

C=CC(=O)OC(C)CCOc1ccc(C2(c3ccc(OCCC(C)OC(=O)C=C)cc3)CCc3ccccc32)cc1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRNA7 P36544 3/20 0.37
THRB P10828 1/20 0.37
LMNA P02545 2/20 0.36
TSHR P16473 3/20 0.34
KMT2A Q03164 2/20 0.34
MEN1 O00255 1/20 0.34
HPGD P15428 3/20 0.34
KIF11 P52732 2/20 0.34
TET3 O43151 1/20 0.34
FBXL19 Q6PCT2 1/20 0.34
CXXC5 Q7LFL8 1/20 0.34
TET1 Q8NFU7 1/20 0.34
KDM2B Q8NHM5 1/20 0.34
CXXC4 Q9H2H0 1/20 0.34
KDM2A Q9Y2K7 1/20 0.34
PPARG P37231 1/20 0.32
PPARA Q07869 1/20 0.32
HTT P42858 1/20 0.32
MAPK1 P28482 1/20 0.32
ALDH1A1 P00352 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28401840 0.90 CHRNA7 (0.38) CHRNA7THRBLMNAKMT2AHPGD
SCHEMBL23524463 0.83 THRB (0.56) CHRNA7THRBLMNATSHRKMT2A
SCHEMBL29028234 0.82 THRB (0.40) THRBLMNATSHRKMT2AMEN1
SCHEMBL2231393 0.80 THRB (0.40) THRBLMNAKMT2AMEN1MAPK1
SCHEMBL22493992 0.79 PIN1 (0.33) CHRNA7MAPK1
SCHEMBL21829153 0.79 THRB (0.38) THRBKIF11MAPTPOLB
SCHEMBL29028186 0.78 POLB (0.34) CHRNA7LMNAKMT2AMEN1KIF11
SCHEMBL21829179 0.78 THRB (0.38) CHRNA7THRBLMNAKMT2AMEN1
SCHEMBL29028231 0.77 CHRNA7 (0.37) CHRNA7LMNATSHRKMT2AMEN1
SCHEMBL29028111 0.76 SLC6A9 (0.34) KIF11

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110392864-B Negative photosensitive resin composition, cured film, element and organic EL display having cured film, and method for producing same 东丽株式会社 2023-05-23 CN disclosed