Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NFE2L2 | Q16236 | 2/20 | 0.46 |
| ▸ | PPARG | P37231 | 1/20 | 0.46 |
| ▸ | CA1 | P00915 | 2/20 | 0.46 |
| ▸ | CA2 | P00918 | 2/20 | 0.46 |
| ▸ | CA9 | Q16790 | 2/20 | 0.46 |
| ▸ | BACE1 | P56817 | 1/20 | 0.42 |
| ▸ | CA4 | P22748 | 1/20 | 0.42 |
| ▸ | GAA | P10253 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | LTA4H | P09960 | 1/20 | 0.41 |
| ▸ | HTT | P42858 | 2/20 | 0.41 |
| ▸ | CXCR2 | P25025 | 2/20 | 0.40 |
| ▸ | PKM | P14618 | 1/20 | 0.40 |
| ▸ | CXCR1 | P25024 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.40 |
| ▸ | CES2 | O00748 | 1/20 | 0.40 |
| ▸ | CES1 | P23141 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28391675 | 0.95 | NFE2L2 (0.45) | NFE2L2PPARGCA1CA2CA9 | |
| SCHEMBL1997269 | 0.88 | CA1 (0.57) | NFE2L2PPARGCA1CA2CA9 | |
| Biphenyl SCHEMBL115843 | 0.86 | BACE1 (0.53) | NFE2L2PPARGCA1CA2CA9 | |
| Iodide SCHEMBL1859836 | 0.86 | CA1 (0.55) | NFE2L2PPARGCA1CA2CA9 | |
| Hydrogen Sulfide SCHEMBL5082548 | 0.86 | CA1 (0.55) | NFE2L2PPARGCA1CA2CA9 | |
| Diphenylsulfane SCHEMBL1593269 | 0.85 | NFE2L2 (0.45) | NFE2L2PPARGCA1CA2CA9 | |
| Iodobenzene SCHEMBL2901004 | 0.85 | NFE2L2 (0.40) | NFE2L2PPARGCA1CA2CA9 | |
| Biphenyl SCHEMBL713552 | 0.85 | BACE1 (0.51) | NFE2L2PPARGCA1CA2CA9 | |
| Biphenyl SCHEMBL4512202 | 0.85 | BACE1 (0.51) | NFE2L2PPARGCA1CA2CA9 | |
| Iodobenzene SCHEMBL2980037 | 0.84 | CA1 (0.40) | CA1CA2CA9CXCR2CXCR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 83 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115685678-A | Star-shaped molecular glass film forming resin and photoresist and preparation method thereof | 南通林格橡塑制品有限公司 | 2023-02-03 | — | — | CN | claimed |
| CN-114874384-A | 193nm photoresist film-forming resin, preparation method thereof and positive photoresist composition | 南通林格橡塑制品有限公司 | 2022-08-09 | — | — | CN | claimed |
| CN-114779577-A | Cyclodextrin inclusion compound molecular glass photoresist | 南通林格橡塑制品有限公司 | 2022-07-22 | — | — | CN | claimed |
| CN-114721221-A | 193nm molecular glass photoresist and preparation method thereof | 南通林格橡塑制品有限公司 | 2022-07-08 | — | — | CN | claimed |
| CN-114442429-A | Molecular glass photoresist of metallocene compound and preparation method thereof | 南通林格橡塑制品有限公司 | 2022-05-06 | — | — | CN | claimed |
| CN-120051504-A | Articles, methods, and compositions comprising a cyclic olefin, a catalyst, and a second polymerizable material | 3M创新有限公司 | 2025-05-27 | — | — | CN | disclosed |
| CN-119620544-A | Photosensitive resin composition, dry film, photosensitive dry film, resist film, molded substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2025-03-14 | — | — | CN | disclosed |
| CN-110317174-B | Hydrogen barrier agent, composition for forming hydrogen barrier film, method for producing hydrogen barrier film, and electronic device | 东京应化工业株式会社 | 2024-10-22 | — | — | CN | disclosed |
| CN-118829948-A | Method for manufacturing plating shaped article | 东京应化工业株式会社 | 2024-10-22 | — | — | CN | disclosed |
| CN-118742854-A | Chemically amplified positive photosensitive composition, method for producing molded substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2024-10-01 | — | — | CN | disclosed |
| CN-110647010-B | Resin composition, dry film, method for producing dry film, resist film, substrate, and method for producing plating molded article | 东京应化工业株式会社 | 2024-02-09 | — | — | CN | disclosed |
| CN-109709770-B | Resin composition, dry film and method for producing same, method for producing resist film and substrate, method for producing plated molded article, and mercapto compound | 东京应化工业株式会社 | 2023-11-24 | — | — | CN | disclosed |
| US-20030022095-A1 | Negative type radiation sensitive resin composition | JSR CORPORATION (JP) | 2003-01-30 | — | — | US | disclosed |
| EP-1270553-A2 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR Corporation (JP) | 2003-01-02 | — | — | EP | disclosed |
| US-20020192593-A1 | Used as chemically amplified resist, exhibits high sensitivity, resolution, radiation transmittance, and surface smoothness, and is free from the problem of partial insolublization during overexposure | JSR CORPORATION (JP) | 2002-12-19 | — | — | US | disclosed |
| EP-1265103-A1 | ACTIVE COMPONENTS AND PHOTOSENSITIVE RESIN COMPOSITIONS CONTAINING THE SAME | Kansai Research Institute, Inc. (JP) | 2002-12-11 | — | — | EP | disclosed |
| EP-1253470-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-10-30 | — | — | EP | disclosed |
| EP-1231205-A1 | VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2002-08-14 | — | — | EP | disclosed |
| EP-0284868-B1 | Photoresist compositions | MICROSI INC (US) | 1995-05-03 | — | — | EP | disclosed |
| EP-0284868-A2 | Photoresist compositions | MicroSi, Inc. (a Delaware corporation) (US) | 1988-10-05 | — | — | EP | disclosed |