Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 1/20 | 0.43 |
| ▸ | CES1 | P23141 | 4/20 | 0.40 |
| ▸ | CES2 | O00748 | 3/20 | 0.40 |
| ▸ | MMP1 | P03956 | 1/20 | 0.39 |
| ▸ | MMP9 | P14780 | 1/20 | 0.39 |
| ▸ | MMP13 | P45452 | 1/20 | 0.39 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.39 |
| ▸ | SCN5A | Q14524 | 3/20 | 0.38 |
| ▸ | SCN9A | Q15858 | 3/20 | 0.38 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.36 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.36 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28379065 | 1.00 | NAAA (0.43) | NAAACES1CES2MMP1MMP9 | |
| SCHEMBL503386 | 1.00 | NAAA (0.43) | NAAACES1CES2MMP1MMP9 | |
| SCHEMBL503876 | 1.00 | NAAA (0.43) | NAAACES1CES2MMP1MMP9 | |
| SCHEMBL11057570 | 0.82 | CES1 (0.45) | CES1 | |
| SCHEMBL28356141 | 0.80 | CES1 (0.38) | NAAACES1CES2PTGS2PTPN1 | |
| SCHEMBL9575220 | 0.79 | CES1 (0.40) | NAAACES1CES2MMP1MMP9 | |
| SCHEMBL36374 | 0.78 | CES1 (0.48) | CES1CES2PTPN1 | |
| SCHEMBL8753891 | 0.78 | SCN5A (0.51) | NAAACES1CES2KCNH2SCN5A | |
| SCHEMBL11667545 | 0.78 | SCN5A (0.51) | NAAACES1CES2KCNH2SCN5A | |
| SCHEMBL8753682 | 0.78 | SCN5A (0.51) | NAAACES1CES2KCNH2SCN5A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11681227-B2 | Enhanced EUV photoresist materials, formulations and processes | IRRESISTIBLE MATERIALS LTD (GB) | 2023-06-20 | — | — | US | disclosed |
| CN-113994256-A | Method for forming EUV patterned resist | 亚历克斯·P·G·罗宾逊 | 2022-01-28 | — | — | CN | disclosed |
| US-20200272050-A1 | Enhanced EUV Photoresist Materials, Formulations and Processes | IRRESISTIBLE MATERIALS, LTD (GB) | 2020-08-27 | — | — | US | disclosed |
| CN-110998437-A | Multi-trigger photoresist compositions and methods | A·P·G·罗宾森 | 2020-04-10 | — | — | CN | disclosed |
| US-10095112-B2 | Multiple trigger photoresist compositions and methods | IRRESISTIBLE MATERIALS LTD (GB) | 2018-10-09 | — | — | US | disclosed |
| US-20180246408-A1 | MULTIPLE TRIGGER PHOTORESIST COMPOSITIONS AND METHODS | IRRESISTIBLE MATERIALS, LTD (GB) | 2018-08-30 | — | — | US | disclosed |
| US-9519215-B2 | Composition of matter and molecular resist made therefrom | IRRESISTIBLE MATERIALS, LTD (GB) | 2016-12-13 | — | — | US | disclosed |
| US-20160246173-A1 | Composition of Matter and Molecular Resist Made Therefrom | IRRESISTIBLE MATERIALS LTD (GB) | 2016-08-25 | — | — | US | disclosed |
| US-9383646-B2 | Two-step photoresist compositions and methods | IRRESISTIBLE MATERIALS LTD (GB) | 2016-07-05 | — | — | US | disclosed |
| US-9323149-B2 | Methanofullerenes | IRRESISTIBLE MATERIALS LTD (GB) | 2016-04-26 | — | — | US | disclosed |
| US-20020192593-A1 | Used as chemically amplified resist, exhibits high sensitivity, resolution, radiation transmittance, and surface smoothness, and is free from the problem of partial insolublization during overexposure | JSR CORPORATION (JP) | 2002-12-19 | — | — | US | disclosed |
| EP-1253470-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-10-30 | — | — | EP | disclosed |
| US-6403288-B1 | COATING WITH COPOLYMER COMPRISING HYDROXYSTYRENE DERIVATIVE MONOMER HAVING ACID DISSOCIABLE GROUP; EXPOSURE TO RADIATION; DEVELOPMENT | JSR CORPORATION (JP) | 2002-06-11 | — | — | US | disclosed |
| US-20020058201-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-05-16 | — | — | US | disclosed |
| EP-1193558-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-04-03 | — | — | EP | disclosed |
| US-6136500-A | CONTAINS A PHOTOACID GENERATOR COMPRISING A COMBINATION OF A COMPOUND THAT GENERATES A CARBOXYLIC ACID UPON EXPOSURE TO RADIATION AND ANOTHER COMPOUND THAT GENERATES ANOTHER ACID UPON EXPOSURE TO RADIATION | JSR CORPORATION (JP) | 2000-10-24 | — | — | US | disclosed |
| EP-1035436-A1 | Resist pattern formation method | JSR Corporation (JP) | 2000-09-13 | — | — | EP | disclosed |
| US-5994022-A | BECOMES SOLUBLE IN ALKALI DEVELOPING SOLUTION BY ACTION OF AN ACID | JSR CORPORATION (JP) | 1999-11-30 | — | — | US | disclosed |
| EP-0898201-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-02-24 | — | — | EP | disclosed |
| EP-0843220-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-05-20 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10095112-B2 | Multiple trigger photoresist compositions and methods | ERCC4, ERCC2, APEX1 | NAAA 1296/4885CES1 2793/4885CES2 1971/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.