Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 1/20 | 0.43 |
| ▸ | CES1 | P23141 | 4/20 | 0.40 |
| ▸ | CES2 | O00748 | 3/20 | 0.40 |
| ▸ | MMP1 | P03956 | 1/20 | 0.39 |
| ▸ | MMP9 | P14780 | 1/20 | 0.39 |
| ▸ | MMP13 | P45452 | 1/20 | 0.39 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.39 |
| ▸ | SCN5A | Q14524 | 3/20 | 0.38 |
| ▸ | SCN9A | Q15858 | 3/20 | 0.38 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.36 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.36 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL503386 | 1.00 | NAAA (0.43) | NAAACES1CES2MMP1MMP9 | |
| SCHEMBL28379065 | 1.00 | NAAA (0.43) | NAAACES1CES2MMP1MMP9 | |
| SCHEMBL2903855 | 1.00 | NAAA (0.43) | NAAACES1CES2MMP1MMP9 | |
| SCHEMBL11057570 | 0.82 | CES1 (0.45) | CES1 | |
| SCHEMBL28356141 | 0.80 | CES1 (0.38) | NAAACES1CES2PTGS2PTPN1 | |
| SCHEMBL9575220 | 0.79 | CES1 (0.40) | NAAACES1CES2MMP1MMP9 | |
| SCHEMBL36374 | 0.78 | CES1 (0.48) | CES1CES2PTPN1 | |
| SCHEMBL11667545 | 0.78 | SCN5A (0.51) | NAAACES1CES2KCNH2SCN5A | |
| SCHEMBL8753682 | 0.78 | SCN5A (0.51) | NAAACES1CES2KCNH2SCN5A | |
| SCHEMBL15865137 | 0.78 | SCN5A (0.51) | NAAACES1CES2KCNH2SCN5A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8435718-B2 | Upper layer-forming composition and photoresist patterning method | JSR CORPORATION (JP) | 2013-05-07 | — | — | US | disclosed |
| EP-1950610-B1 | IMMERSION LITHOGRAPHIC COMPOSITION FOR FORMING UPPER FILM AND METHOD FOR FORMING PHOTORESIST PATTERN | JSR CORP (JP) | 2012-05-02 | — | — | EP | disclosed |
| US-20120028198-A1 | UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2012-02-02 | — | — | US | disclosed |
| US-20100003615-A1 | UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2010-01-07 | — | — | US | disclosed |
| EP-1950610-A1 | COMPOSITION FOR FORMING UPPER FILM AND METHOD FOR FORMING PHOTORESIST PATTERN | JSR Corporation (JP) | 2008-07-30 | — | — | EP | disclosed |