SCHEMBL29044637

SCHEMBL29044637

CCN(CC)C1(c2c(C)n(CC)c3ccccc23)OC(=O)c2cccnc21

nearest known ligand 0.40

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
GSK3A P49840 2/20 0.40
GSK3B P49841 2/20 0.40
ALDH1A1 P00352 3/20 0.37
KDM4E B2RXH2 4/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
LMNA P02545 1/20 0.35
PKM P14618 1/20 0.35
TSHR P16473 1/20 0.35
RCE1 Q9Y256 1/20 0.34
MAPK14 Q16539 1/20 0.34
NPY5R Q15761 2/20 0.34
METAP2 P50579 2/20 0.34
CCNA2 P20248 1/20 0.34
CDK2 P24941 1/20 0.34
PDE5A O76074 1/20 0.33
CYP19A1 P11511 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11242383 0.89 GSK3A (0.38) GSK3AGSK3BALDH1A1KDM4ESMN1; SMN2
SCHEMBL11245671 0.86 ALDH1A1 (0.38) GSK3AGSK3BALDH1A1KDM4ESMN1; SMN2
SCHEMBL11232126 0.85 KDM4E (0.37) GSK3AGSK3BALDH1A1KDM4ESMN1; SMN2
SCHEMBL30680380 0.84 ALDH1A1 (0.40) GSK3AGSK3BALDH1A1KDM4ESMN1; SMN2
SCHEMBL9358670 0.84 ALDH1A1 (0.40) GSK3AGSK3BALDH1A1KDM4ESMN1; SMN2
SCHEMBL11237223 0.84 MAPT (0.35) GSK3AGSK3BALDH1A1KDM4ESMN1; SMN2
SCHEMBL11247969 0.82 SMN1; SMN2 (0.39) GSK3AGSK3BALDH1A1KDM4ESMN1; SMN2
SCHEMBL11235510 0.81 RORA (0.36) GSK3AGSK3BMEN1KMT2ANPY5R
SCHEMBL214021 0.79 GSK3A (0.34) GSK3AGSK3BALDH1A1KDM4ESMN1; SMN2
SCHEMBL29735564 0.79 GSK3A (0.34) GSK3AGSK3BALDH1A1KDM4ESMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115298612-A Photosensitive transfer material, method for producing resin pattern, method for producing circuit wiring, and temporary support for photosensitive transfer material 富士胶片株式会社 2022-11-04 CN disclosed