Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SIGMAR1 | Q99720 | 10/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.38 |
| ▸ | TSHR | P16473 | 2/20 | 0.38 |
| ▸ | HPGD | P15428 | 2/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.38 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.38 |
| ▸ | TUBB4A | P04350 | 1/20 | 0.38 |
| ▸ | TUBB | P07437 | 1/20 | 0.38 |
| ▸ | TUBA3C | P0DPH7 | 1/20 | 0.38 |
| ▸ | STAT3 | P40763 | 1/20 | 0.38 |
| ▸ | TUBA1B | P68363 | 1/20 | 0.38 |
| ▸ | TUBA4A | P68366 | 1/20 | 0.38 |
| ▸ | TUBB4B | P68371 | 1/20 | 0.38 |
| ▸ | TUBB3 | Q13509 | 1/20 | 0.38 |
| ▸ | TUBB2A | Q13885 | 1/20 | 0.38 |
| ▸ | TUBB8 | Q3ZCM7 | 1/20 | 0.38 |
| ▸ | TUBA3E | Q6PEY2 | 1/20 | 0.38 |
| ▸ | TUBA1A | Q71U36 | 1/20 | 0.38 |
| ▸ | TUBA1C | Q9BQE3 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5183874 | 0.80 | SIGMAR1 (0.47) | SIGMAR1ALDH1A1HSD17B10TSHRHPGD | |
| SCHEMBL31426783 | 0.80 | SIGMAR1 (0.47) | SIGMAR1ALDH1A1HSD17B10TSHRHPGD | |
| Ammonia Solution, Strong SCHEMBL28785993 | 0.76 | SIGMAR1 (0.43) | SIGMAR1ALDH1A1HSD17B10TSHRHPGD | |
| SCHEMBL4168193 | 0.74 | ALDH1A1 (0.57) | SIGMAR1ALDH1A1HSD17B10TSHRHPGD | |
| SCHEMBL28785991 | 0.74 | SIGMAR1 (0.42) | SIGMAR1ALDH1A1HSD17B10TSHRHPGD | |
| SCHEMBL6509235 | 0.73 | SIGMAR1 (0.52) | SIGMAR1ALDH1A1HSD17B10TSHRHPGD | |
| SCHEMBL29560815 | 0.73 | SIGMAR1 (0.48) | SIGMAR1ALDH1A1HSD17B10TSHRHPGD | |
| SCHEMBL3068516 | 0.73 | SIGMAR1 (0.48) | SIGMAR1ALDH1A1HSD17B10TSHRHPGD | |
| Ammonia Solution, Strong SCHEMBL2287978 | 0.72 | SIGMAR1 (0.47) | SIGMAR1ALDH1A1HSD17B10TSHRHPGD | |
| Ammonia Solution, Strong SCHEMBL29399631 | 0.72 | SIGMAR1 (0.47) | SIGMAR1ALDH1A1HSD17B10TSHRHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 92 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115445780-A | High-iron high-mud zinc oxide ore combined collecting agent and application thereof | 中南大学 | 2022-12-09 | — | — | CN | claimed |
| CN-114798185-A | Flotation recovery method for high-calcium-magnesium high-argillaceous zinc carbonate | 西北矿冶研究院 | 2022-07-29 | — | — | CN | claimed |
| EP-1468981-B1 | Production method of adamantyl acrylate compounds | MITSUBISHI GAS CHEMICAL CO (JP) | 2012-08-01 | — | — | EP | claimed |
| US-7067692-B2 | Production method of adamantyl acrylate compounds | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2006-06-27 | — | — | US | claimed |
| US-20040210082-A1 | Production method of adamantyl acrylate compounds | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-10-21 | — | — | US | claimed |
| EP-1468981-A1 | Production method of adamantyl acrylate compounds | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-10-20 | — | — | EP | claimed |
| JP-62021711-A | — | — | None | — | — | JP | disclosed |
| WO-2024135708-A1 | METHOD FOR PRODUCING COMPOUND, POLYMER, COMPOSITION, AND PATTERN FORMATION METHOD | 三菱瓦斯化学株式会社 | 2024-06-27 | — | — | WO | disclosed |
| US-20240210827-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20240176240-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR POLYIMIDE CURED FILM USING SAME, AND POLYIMIDE CURED FILM | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-05-30 | — | — | US | disclosed |
| WO-2024095927-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN USING SAME, AND METHOD FOR PRODUCING POLYIMIDE FILM USING SAME | 旭化成株式会社 | 2024-05-10 | — | — | WO | disclosed |
| WO-2024090486-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN, AND SEMICONDUCTOR DEVICE | 旭化成株式会社 | 2024-05-02 | — | — | WO | disclosed |
| WO-2024090567-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR POLYIMIDE CURED FILM USING SAME, AND POLYIMIDE CURED FILM | 旭化成株式会社 | 2024-05-02 | — | — | WO | disclosed |
| US-6130328-A | Process for preparing carboxypolysaccharide | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2000-10-10 | — | — | US | disclosed |
| EP-0915102-A1 | Process for preparing carboxypolysaccharide | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1999-05-12 | — | — | EP | disclosed |
| EP-0580108-B1 | A photosensitive polyimide composition | ASAHI CHEMICAL IND (JP) | 1997-03-12 | — | — | EP | disclosed |
| EP-0718696-A2 | A photosensitive polyimide composition | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1996-06-26 | — | — | EP | disclosed |
| US-5397682-A | Polyimide precursor and photosensitive composition containing the same | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1995-03-14 | — | — | US | disclosed |
| EP-0580108-A2 | A photosensitive polyimide composition | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1994-01-26 | — | — | EP | disclosed |
| JP-S6221711-A | SELECTIVE SEPARATION AND RECOVERY OF GALLIUM | UBE IND LTD | 1987-01-30 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20040210082-A1 | Production method of adamantyl acrylate compounds | APEH, CYP51A1, NAAA | SIGMAR1 2876/4885ALDH1A1 71/4885HSD17B10 27/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.