Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2D6 | P10635 | 1/20 | 0.47 |
| ▸ | ADRA2A | P08913 | 6/20 | 0.43 |
| ▸ | ADRA2B | P18089 | 6/20 | 0.43 |
| ▸ | ADRA2C | P18825 | 6/20 | 0.43 |
| ▸ | RORC | P51449 | 2/20 | 0.41 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.40 |
| ▸ | MAOA | P21397 | 3/20 | 0.39 |
| ▸ | MAOB | P27338 | 3/20 | 0.39 |
| ▸ | NISCH | Q9Y2I1 | 1/20 | 0.39 |
| ▸ | HTR6 | P50406 | 2/20 | 0.38 |
| ▸ | LPAR1 | Q92633 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | PPARG | P37231 | 3/20 | 0.37 |
| ▸ | PPARA | Q07869 | 3/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30003434 | 0.86 | KDM4E (0.40) | CYP2D6ADRA2AADRA2BADRA2CRORC | |
| SCHEMBL30003537 | 0.78 | CYP2D6 (0.44) | CYP2D6ADRA2BSLC6A4KDM4EPPARG | |
| SCHEMBL1888768 | 0.75 | IDO1 (0.55) | CYP2D6KDM4EKMT2A | |
| SCHEMBL6656057 | 0.75 | SLC6A2 (0.47) | SLC6A4HTR6PPARGPPARAKMT2A | |
| SCHEMBL753811 | 0.72 | ADRA2A (0.44) | ADRA2AADRA2BADRA2CRORCHTR6 | |
| Trimethylammonium SCHEMBL9995406 | 0.72 | SLC6A2 (0.51) | SLC6A4HTR6KMT2A | |
| SCHEMBL12812304 | 0.71 | HTR6 (0.37) | ADRA2AADRA2BADRA2CRORCSLC6A4 | |
| SCHEMBL10183517 | 0.71 | TSHR (0.41) | RORCSLC6A4NISCHHTR6KDM4E | |
| SCHEMBL753956 | 0.71 | HPRT1 (0.41) | RORCSLC6A4HTR6 | |
| SCHEMBL9617390 | 0.71 | RORC (0.58) | RORCSLC6A4KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120077329-A | Photosensitive resin composition, photosensitive resin laminate, and method for forming resist pattern | 旭化成株式会社 | 2025-05-30 | — | — | CN | disclosed |
| CN-117063121-A | Photosensitive film, photosensitive element, and method for producing laminate | 株式会社力森诺科 | 2023-11-14 | — | — | CN | disclosed |
| CN-116830039-A | Photosensitive resin composition, photosensitive resin sheet, cured product, hollow structure, electronic component, and elastic wave filter | 东丽株式会社 | 2023-09-29 | — | — | CN | disclosed |
| CN-114730127-B | Photosensitive resin composition, photosensitive resin sheet, hollow structure, cured product, method for producing hollow structure, electronic component, and elastic wave filter | 东丽株式会社 | 2023-05-12 | — | — | CN | disclosed |
| CN-110891980-B | Radical polymerization control agent and radical polymerization control method | 川崎化成工业株式会社 | 2022-09-30 | — | — | CN | disclosed |
| CN-114730127-A | Photosensitive resin composition, photosensitive resin sheet, hollow structure, cured product, method for producing hollow structure, electronic component, and elastic wave filter | 东丽株式会社 | 2022-07-08 | — | — | CN | disclosed |