⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6662490 | 0.89 | IDO1 (0.31) | — | |
| SCHEMBL29104864 | 0.82 | IGFBP3 (0.34) | — | |
| SCHEMBL23854459 | 0.81 | — | — | |
| SCHEMBL6663241 | 0.81 | EPHX2 (0.32) | — | |
| SCHEMBL28608349 | 0.80 | — | — | |
| SCHEMBL23854465 | 0.79 | — | — | |
| SCHEMBL482840 | 0.78 | KDM4E (0.39) | — | |
| SCHEMBL482664 | 0.77 | ALDH1A1 (0.42) | — | |
| SCHEMBL17237546 | 0.76 | — | — | |
| SCHEMBL482859 | 0.76 | PSIP1 (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113168093-B | Pattern forming method, photosensitive resin composition, cured film, laminate, and device | 富士胶片株式会社 | 2024-04-30 | — | — | CN | disclosed |
| CN-113383273-B | Photosensitive resin composition, pattern forming method, cured film, laminate, and device | 富士胶片株式会社 | 2023-11-14 | — | — | CN | disclosed |