Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AR | P10275 | 10/20 | 0.41 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.40 |
| ▸ | PDE4B | Q07343 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | MAOB | P27338 | 2/20 | 0.35 |
| ▸ | NOS2 | P35228 | 1/20 | 0.35 |
| ▸ | TP53 | P04637 | 1/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30132473 | 0.91 | AR (0.52) | ARALDH1A1HPGDMAOBCYP3A4 | |
| SCHEMBL11757098 | 0.82 | FNTA (0.43) | AR | |
| SCHEMBL9447454 | 0.81 | AR (0.38) | ARALDH1A1SMN1; SMN2 | |
| SCHEMBL2164753 | 0.79 | XDH (0.44) | ARALDH1A1HPGDMAOBTP53 | |
| SCHEMBL370082 | 0.79 | KDM4E (0.44) | ALDH1A1HPGDMAOBTP53CYP3A4 | |
| SCHEMBL8770000 | 0.77 | ALDH1A1 (0.41) | ALDH1A1TP53CYP3A4ALOX15TSHR | |
| SCHEMBL1444530 | 0.77 | AR (0.50) | ARCYP19A1ALDH1A1HPGDMAOB | |
| SCHEMBL21192542 | 0.77 | MAPT (0.37) | ALDH1A1TP53CYP3A4ALOX15TSHR | |
| SCHEMBL29135913 | 0.76 | MAOB (0.46) | ARMAOB | |
| SCHEMBL4174164 | 0.74 | AR (0.60) | AR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110637256-B | Material for forming film for lithography, composition for forming film for lithography, underlayer film for lithography, and pattern forming method | 三菱瓦斯化学株式会社 | 2024-01-09 | — | — | CN | disclosed |