SCHEMBL29145309

SCHEMBL29145309

[SiH3]C=CC1=Cc2ccccc21

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CDC25A P30304 1/20 0.31
CDC25B P30305 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9118904 0.85 CDC25B (0.34) CDC25ACDC25B
SCHEMBL9118912 0.85 CDC25B (0.34) CDC25ACDC25B
SCHEMBL5684522 0.76 MAOB (0.42)
SCHEMBL5684532 0.76 MAOB (0.42)
SCHEMBL31571666 0.73 MEN1 (0.39) CDC25ACDC25B
SCHEMBL17601831 0.73 CDC25A (0.38) CDC25ACDC25B
SCHEMBL9118901 0.72 NFE2L2 (0.39)
SCHEMBL29620612 0.71 ALDH1A1 (0.36) CDC25ACDC25B
SCHEMBL29706093 0.71 HCAR2 (0.50)
SCHEMBL28391546 0.68 CDC25A (0.34) CDC25ACDC25B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117111405-A Preparation of linear polysiloxane low dielectric loss photosensitive resin and application of photoetching patterning 西南科技大学 2023-11-24 CN claimed
CN-117111405-A Preparation of linear polysiloxane low dielectric loss photosensitive resin and application of photoetching patterning 西南科技大学 2023-11-24 CN disclosed
CN-117111405-A Preparation of linear polysiloxane low dielectric loss photosensitive resin and application of photoetching patterning 西南科技大学 2023-11-24 CN disclosed